Used USHIO UMA-802-HC55RM #9392072 for sale

USHIO UMA-802-HC55RM exposure equipment is a high precision single beam mask aligner. It is designed for photolithography and nanoimprint technology, providing highly precise placement and imaging of photosensitive material. The system includes a compact, air cooled UV light source, an 80 mm vacuum plate, and an automatic vision alignment unit. The UV light source features a metal halide arc lamp, with a power rating of 250 watts and an exposure wavelength of 350 to 450 nanometers. Its quartz reflector ensures a precise focus of the light, and its 1500 watt power supplies guarantee reliable and consistent performance. The light source is highly reliable and can be used continuously for extended periods of time. UMA-802-HC55RM's vacuum plate is of high construction and boasts a circular motion range of 16 micro-metres, ensuring excellent placement accuracy of photosensitive materials. The plate is designed to maintain its accuracy for a dirt on its surface, while the movement of the plate is also assisted by differential drive screws. The vacuum plate also allows for the movement within the X and Y axes for a more precise alignment. USHIO UMA-802-HC55RM's automatic vision alignment machine is highly precise and can be programmed to seek out and align photosensitive material to a preset overlay template. This ensures an accurate and repeatable process every time. The alignment tool also includes an auto-focus function, allowing users to take advantage of its capabilities in applications such as nanoimprint lithography. Lastly, UMA-802-HC55RM exposure asset features an advanced optics package. The optics package includes an achromatic lens, beam splitter, and an aperture. The optics effectively eliminate any aberration problems, allowing for wavelength uniformity and efficiency. The optics also feature an expansion model in the UV range, allowing for higher speed image formation. Overall, USHIO UMA-802-HC55RM exposure equipment is a state-of-the-art production unit, suitable for photolithography and nanoimprint technology. It offers a reliable and consistent performance with a high precision single beam mask aligner, a powerful UV light source, a highly accurate vacuum plate, an advanced automatic vision alignment system, and an advanced optics package. UMA-802-HC55RM is an excellent choice for laboratories requiring a reliable and precise exposure unit.