Used USHIO Unihard #9251839 for sale

USHIO Unihard is an exposure equipment used in semiconductor processing. It features an automated exposure system to ensure consistent and repeatable wafer exposure in IC production lines. The unit is designed to process a wide range of sizes from 4-inch to 12-inch wafers at speeds up to 24 wafers per hour. It is equipped with a high-precision X-Y stage to ensure uniform exposure over a wide wafer size range. Unihard also features an advanced optics machine, which includes an integrated lens, illumination tool, and projection optics. This combination of optics and illumination ensures the desired dose distribution with uniform uniformity and sharp resolution over the entire wafer. The lens can be up to 300 mm in aperture and has a very wide coverage range. The illumination asset incorporates an advanced beam-shaping technology that enables bright and uniform exposure over the entire wafer. The model also features a variety of advanced control systems, such as focusing systems, temperature control, and exposure control. The focus equipment adjusts the X-Y stage to ensure precise focusing and repeatability. Temperature control ensures uniform exposure across the entire wafer, while the exposure control system ensures consistent exposure time and dose. The unit also includes a number of safety features, including a wafer-handling machine with a self-locking tool for the shutter and a safety interlock asset with emergency shut-down capability. Additionally, wafers can be safely placed into and removed from the exposure stage without any manual intervention. USHIO Unihard also offers a variety of software-based automation tools, such as image processing, pattern recognition, and data analysis. These tools enable the user to perform complex operations such as exposure optimization, recipe development, non-uniformity correction, and exposure verification. In summary, Unihard is a high-precision and highly automated wafer exposure model designed to ensure consistent and repeatable wafer exposure in IC production lines. This equipment features a variety of advanced optics, control systems, and automation tools, making it an ideal solution for the most demanding semiconductor processes.