USHIO is a prominent manufacturer of exposure equipment that are widely recognized for their high-quality performance, reliability, and cutting-edge technologies. These exposure systems provide precise and efficient exposure capabilities across various industries. One of USHIO's analogues exposure units is the UMA-2003. It is equipped with state-of-the-art features such as a powerful light source, precise alignment, and advanced control machines. The UMA-2003 ensures accurate and uniform exposure, resulting in excellent image quality and reduced production time. Another notable exposure system from USHIO is the UMA-1002, which offers unparalleled exposure capabilities for diverse applications. It boasts enhanced productivity, superior resolution, and exceptional precision, making it suitable for industries such as semiconductor manufacturing, PCB production, and LCD panel manufacturing. The UFX-2259B-AMB01 is an advanced exposure system from USHIO with a focus on nanotechnology and photolithography. It features a high-resolution mask aligner and innovative alignment techniques, enabling precise pattern transfer onto substrates. The UFX-2259B-AMB01 is widely used in the production of microelectronic devices, MEMS, and photonics. USHIO's exposure tools provide several advantages, including high-speed exposure, accurate pattern alignment, reduced production costs, and improved yields. These assets are also known for their user-friendly interfaces, easy maintenance, and comprehensive technical support. Overall, USHIO's exposure models, such as the UMA-2003, UMA-1002, and UFX-2259B-AMB01, deliver cutting-edge technologies, superior performance, and exceptional reliability, making them an ideal choice for various industrial applications.