Used UVEXS 850A #9021065 for sale

UVEXS 850A is a comprehensive automated exposure equipment designed with scalability and flexibility for the lithography research and manufacturing industry. It is capable of exposing die, metal, epoxy, glass, and polymeric substrate types in wafer, panel, or sheet-like formats. With this automated exposure system, mask sizes and substrate regions as large as 200x200mm can be exposed. 850A is designed to be easily integrated into the lithography workflow for both research and production situations. It is capable of reproducing continuous multi-track exposures, as well as continuous variable single line blocking and shifting exposures. Additionally, the unit is equipped with flexible wafer chucking and vision alignment features. The latter enables substrate alignment through recognition of fiducials and alignment targets built into the device with precision down to 2 micron accuracy. For machine control, UVEXS 850A is equipped with an integrated touch screen. This GUI allows the operator to quickly and accurately adjust and modify the exposure parameters of the tool as well as easily monitor the asset performance. A remote control interface is available for communication with the device over Ethernet. This feature allows remote monitoring and diagnostics to be conducted, as well as control by external systems. For optical performance, 850A is powered by an unlimited source of 253.7nm light with minimum line width of 0.25μm, enabling high resolution back to base exposure. Additionally, the model is equipped with a motor driven nosepiece that allows exposures in the same direction with variable angle up to 45 degrees. The device is equipped with an automated cleaning station for the illumination equipment, as well as automated wafer and substrate handling. UVEXS 850A also includes an advanced mapping mechanism, which allows users to accurately measure the exposure homogeneity across an entire substrate with excellent repeatability and accuracy. 850A is a comprehensive automation solution for the lithography research and manufacturing industry, offering features and capabilities necessary for consistent and reliable exposure performance. The system is capable of producing repeatable results with excellent line resolution down to 0.25 microns with precision alignment down to 2 micron levels. It is easy to setup, operate, monitor, and control, allowing users to quickly and accurately adjust and modify exposure parameters according to their needs. The flexibility and scalability of UVEXS 850A ensure reliable and reproducible exposure.