Used ATMI 3CHEM #9395590 for sale

ATMI 3CHEM is a facility equipment designed to provide an advanced platform for the development and optimization of thin film processes and materials. The main components of the equipment are a deposition chamber, a process control equipment, and a layer characterization system. The deposition chamber is a closed-loop airlift reactor with a heated substrate holder and a combinatory chemistry injection unit for multiple gases. This chamber provides an ideal environment for advanced thin film deposition process and materials, allowing for precise control of process parameters such as pressure, temperature, gas composition, and gas flowrates. The process control machine is designed to ensure optimum process conditions and uniformity of the deposited thin films, providing both manual and automatic control of the deposition process. The layer characterization tool allows for chemical, physical, and electrical property characterization of the deposition process and thin films. It has the capability to measure reflectometry, thickness, refractive index, stress and strain, morphology, film adhesion and stability, electrical conductivity, interfacial energy and stability, work functions, optical constants, and homogeneity across multiple wafers. Finally, 3CHEM equipment offers an advanced set of analytical tools which enables researchers to quickly generate visual representations of the data, as well as to analyze, interpret, and generate actionable insights into deposition processes and thin films. Additional features of ATMI 3CHEM include automated algorithms for data analysis and process optimization, open asset architecture for scalability and ease of use, and a comprehensive library of thin film processes and materials. Overall, 3CHEM is a comprehensive facility equipment designed to provide a wide range of tools and capabilities to research laboratories and production facilities for the development and optimization of thin film processes and materials.