Used BOC EDWARDS Helios-J #293667010 for sale
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BOC EDWARDS Helios-J is a rapid thermal processor used in many different industries for a variety of purposes. It is a powerful tool forprocessing and treating a variety of substrates, from silicon wafers to small parts. It is considered to be one of the most reliable and advanced rapid thermal processors on the market. Helios-J is a horizontally oriented thermal processor with a chamber that is cylindrical in shape. Inside the chamber, heating elements are used to heat substrates. This thermal processor has a temperature range of 200 ˚C to 1100˚C and it can be used in both high and low-temperature processes. An exhaust equipment is built into the chamber to help keep the temperature stable during the process. The user can monitor the temperature of the chamber and the substrate using a built-in thermocouple and optical pyrometer. BOC EDWARDS Helios-J is also fitted with automatic and manual control systems, which enable the user to control the speed and duration of a process, as well as the power and temperature of the chamber. The user is able to fine-tune the performance of the processor by adjusting many process parameters. In addition, the support software for the thermal processor allows the user to monitor process parameters such as temperature, power and time. In addition to controlling the power and temperature of the processor, Helios-J is also equipped with an inert atmosphere control system. This unit is used to control the nitrogen, argon or other gases used in the processing chamber. The inert atmosphere control machine also helps to prevent fires and explosions that can occur in some processes, as well as ensuring a safer and more consistent process. BOC EDWARDS Helios-J is suitable for use in a number of industrial settings, such as semiconductor fabrication, medical device fabrication, assembly and packaging. It is a reliable and powerful tool for many different applications, and it offers the user a reliable and accurate way to process and treat a variety of substrates.
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