Used BOC EDWARDS TPU 4 #293637343 for sale

BOC EDWARDS TPU 4 is a facility equipment designed for thin film deposition, ion beam etching, and surface modification. It is a compact, multi-purpose, single-chamber equipment for thin film processing applications. This system is suitable for use in research, development, pilot production and production applications. TPU 4 is powered by Pulsed filament, which allows for a continuous process without the need for shut down for a major cleaning procedure every 24 hours. It enables superior films to be deposited with precision control of thickness and composition at a high rate. It also facilitates advanced process control capabilities by providing excellent reproducibility, flexibility, and process stability. BOC EDWARDS TPU 4 is capable of achieving large area uniform deposition with a low contaminant rate and has an integrated in- situ diagnostics capability. The main components of TPU 4 are the main process chamber, the controller unit, the user interface, and a dedicated networked computer. The main process chamber is a cylindrical chamber constructed from stainless steel and uses two fused quartz doors for entry into the process chamber and the viewing ports. Inside the chamber, there are various processes and components that are designed to deposit and etch thin films. These components include a substrate holder, a hot filament gun, a substrate bias unit, an ion source, an extraction electrode, a shield electrode, and a shutter machine. The hot filament gun creates a stream of atomic and molecular species which is used to deposit the thin film onto the substrate. The substrate bias tool is used to apply an electrical bias to the substrate material, allowing it to interact with the energetic species coming from the hot filament gun and the gas species introduced into the chamber. The ion source is used to create a beam of energetic ions that can be used to etch the film. The extraction electrode and the shield electrode, aid in the control of the ion beam, whereas the shutter asset is used to regulate the flow of gases into the chamber. The user interface is designed to facilitate the easy and efficient operation of the equipment. It consists of an LCD display and a menu driven control panel that is used to input set parameters and process sequences. It also contains a graphical display which allows the user to view the deposition process. The controller unit consists of a series of microprocessors and peripheral controllers that are connected to the network machine. It is used for controlling all the components of the facility and for monitoring and display the process sequence. In addition, BOC EDWARDS TPU 4 is equipped with a variety of safety features such as mechanical interlocks, a door safety switch and an internal anti-interference protection model. It also features an advanced vacuum monitoring equipment that alerts the user in the event of any hazardous vacuum conditions. TPU 4 is an affordable, reliable and high performance facility equipment that is well-suited for a variety of single-chamber applications. It is capable of outperforming traditional deposition and etch technologies. With its advanced process control capabilities and its integrated in- situ diagnostics, BOC EDWARDS TPU 4 provides users with an efficient, safe and cost-effective solution for their thin film deposition, ion beam etching, and surface modification needs.