Used EDWARDS Atlas MK3B #293670650 for sale

EDWARDS Atlas MK3B is a facility equipment designed for vacuum deposition of materials onto substrates, such as silicon wafers. It utilizes electron beam evaporation and direct current sputtering processes. The electron beam processes allow for the precise delivery of precursor material in order to produce a uniform coating of desired materials on substrates. The sputtering process is used to deposit thicker metal films on substrates while maintaining an even layer thickness during the deposition process. EDWARDS ATLAS MK 3 B features an integrated vacuum processing chamber that is designed to provide high thermal and mechanical stability. It is outfitted with a linear-bearing to ensure smooth and precise motion of the electron beam guns. Additionally, it features a high-performance mechanical pump designed for rapid evacuation of the chamber. The chamber is equipped with a variety of sensors to monitor temperature and other process parameters, as well as, a has an integrated insulation system to reduce the amount of external noise and interference. Atlas MK3B is also equipped with a powerful software package to enable full control and monitoring of the deposition process. The software features a graphical user interface which allows for easy manipulation of the deposition parameters such as, the deposition rate, thickness, temperature, and other process parameters. Additionally, the software provides real-time data logging of the deposited thickness, allowing for accurate monitoring of the deposition process. Furthermore, ATLAS MK 3 B is designed to be compatible with a variety of substrates. It is capable of handling wafer substrates up to 200mm in diameter and has adjustable endpoint and shutter switches that enable the deposition process to be halted when a predefined thickness or coverage has been achieved. The machine is also designed with a built-in pedestal support for substrates to allow for reliable handling of large substrates. EDWARDS Atlas MK3B is an excellent piece of equipment for vacuum deposition processes for material growth, passivation and sealing of devices. With its powerful sputtering and electron beam evaporation processes, advanced integration features, and real-time data logging capabilities, users can be assured of precise and accurate deposition of materials onto their substrates.