Used FSI / TEL / TOKYO ELECTRON PROTEUS I #9235351 for sale

FSI / TEL / TOKYO ELECTRON PROTEUS I is a facility equipment designed to address processes in the semiconductor industry, specifically atomic layer deposition (ALD) and chemical vapor deposition (CVD). The application of FSI PROTEUS I can be used to position and align substrates as part of these processes. It can change the temperature and atmosphere automatically and accurately, and monitor deposition processes. TEL PROTEUS I is a specialized chamber specifically designed to fit into existing semiconductor fabrication systems. It has an ultra-small cylindrical chamber, which is optimized for each individual process. The substrate is heated with the use of an inductive coil. This is combined with a powerful microwave signal which is used to generate a high-temperature Convective Assisted Deposition (CAD) environment. TOKYO ELECTRON PROTEUS I is capable of controlling temperature and gas flow automatically and accurately. It is equipped with a propeller pump that utilizes a patented high-efficiency drum design. This is combined with a low flow-rate gas control system that is capable of accurately and precisely controlling gas flow. The operating pressure ranges from one hundred to one thousand torr, and the temperature range is from twenty five to five hundred degrees Celsius. PROTEUS I has a real-time monitor for in-situ analysis of deposition. The monitor is capable of reading thickness, rate, uniformity, and composition of each layer as it deposits. This ensures that the deposition process is in compliance with the specifications. Additionally, the monitor can detect in-process abnormalities and alert the operators. FSI / TEL / TOKYO ELECTRON PROTEUS I has a multi-functional remote controller unit that provides the operators with the ability to monitor and control the process from a remote location. This eliminates the necessity of walking to the machine for monitoring and adjustments. It is also capable of interfacing with other machines within the production line. FSI PROTEUS I has a low-noise, high-efficiency fan motor. This enables the equipment to be used in clean rooms without affecting other processes. Furthermore, it has a professional gas and vacuum system. This allows quick scrubbing and evacuating of the chamber to minimize waiting time. In conclusion, TEL PROTEUS I is a facility equipment designed to ensure that processes in the semiconductor industry, such as ALD and CVD, are conducted in an efficient and accurate manner. It is highly accurate and controllable, and provides the operators with the ability to monitor the process from a remote location. Additionally, its low noise, high-efficiency fan motor makes it suitable for clean rooms. All these features make TOKYO ELECTRON PROTEUS I an invaluable tool for semiconductor fabrication.