Used KLA / TENCOR IB840F #9293038 for sale

KLA / TENCOR IB840F is a facility equipment designed for inspecting delicate wafer surface resultantly produced after CMP process. The equipment is composed of four independent, interconnected modules specifically for structural review comprised of digital image acquisition, stage autofocus calibration, illumination review, and image analysis. The Digital Image Acquisition (DIA) module measures non-line-of-sight optical properties of a sample at the pixel level. The DIA module employs two independent throughput-based array cameras. The Stage Autofocus Calibration (SAFC) module accurately positions the wafer to be inspected. The SAFC module is equipped with a two-dimensional linear stage and a five-stage fine adjustment mechanism. The Illumination Review (IR) module inspects the microscopic features of the sample accurately. The IR module utilizes a wide range of lighting patterns that can accommodate different materials and structures. Finally, the Image Analysis (IA) module provides powerful image-analysis and characterization tools. The IA module uses a computer-aided tool that allows users to measure several parameters of a structure. This module also employs an automated decision-making algorithm to detect critical defects. To ensure precise and reliable results, KLA IB840F is integrated with up-to-date technologies and features including adaptive optics, variable native pixel rates, and digitizer bandwidth control. The system utilizes advanced optics and high-power illumination sources to detect delicate features down to the sub-micron level. Its camera systems operate at up to 256 frames per second to generate and acquire high-resolution images. Aside from that, the unit includes a color filter wheel that helps acquire images from multiple colors. Additionally, the machine's advanced data analysis algorithms allow users to extract detailed physics-based information to accurately identify defects. Moreover, its intuitive user interface provides a graphical representation of data that helps researchers to compare images easily. In conclusion, TENCOR IB840F is a user-friendly, highly reliable facility equipment that is used in inspecting delicate structures and surfaces of wafers produced after CMP processes. This tool is equipped with a variety of features such as adaptive optics, variable native pixel rates, digitizer bandwidth control, and color filters. Moreover, it is integrated with advanced data analysis algorithms that help detect critical defects.