Used PHYSICAL ELECTRONICS 45-410 #293608877 for sale
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PHYSICAL ELECTRONICS 45-410 is an advanced facility equipment used for studying and creating thin films. This type of device has multiple uses and is widely utilized in the semi-conductor industry for thin film structures and their functional properties. It consists of a non-evaporable getter pump, turbomolecular pump, high-voltage pulsed power supply, Langmuir probe, particle detector, and high-sensitivity electron microscope. The getter pump helps keep the operating chamber at a precision-correct pressure level. The turbomolecular pump helps in processing thin films at faster rates and is used to prevent contaminants getting into the chamber during the process. The high-voltage power supply is used to create electrical discharges in order to deposit thin films. This supply includes timer, voltage, and current controllers which allow the user to easily change parameters in order to precisely deposit thin films. The Langmuir probe is used to measure plasma properties such as electron and ion densities, electron temperatures and other properties. The particle detector is used to measure particles emitted from the plasma during deposition processes. 45-410 also features a high-sensitivity electron microscope, allowing for a wide range of experiments over a wide range of magnifications for thin films. The microscope contains high resolution optics, detectors and signal processors for capturing the finest details in the samples. The microscope is equipped with a variety of high end detectors for imaging particles and crystalline structures in the samples. PHYSICAL ELECTRONICS 45-410 is considered a high performance system that can be used for various processes such as pulsed plasma deposition or etching, surface analysis and characterization, Langmuir probe studies, particle detection and electron microscopy. It is specifically designed for the purpose of studying and creating thin films, providing superior quality and precision of results. It combines the advantages of both physical and chemical processing of thin films and has become an important tool for research purposes in the semi-conductor industry.
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