Used STEC LF-310A-EVD #198118 for sale

STEC LF-310A-EVD is a high-quality facility equipment specifically designed for the purpose of evaporative deposition. It is an advanced apparatus that has been created to be able to apply a thin film of metal evaporation onto various substrates. This type of deposition equipment is largely used in the research and development of semi-conductors and optoelectronics. The system has the capability of achieving an extremely precise deposition of metals and dielectrics due to the superior accuracy and repeatability that it offers. LF-310A-EVD is composed of several main components. This includes a chamber, two internal evaporation sources, a computer monitor, and a controller. The chamber acts as the physical framework of the unit and is where all of the components of the machine reside. It is constructed out of corrosion resistant materials that are both insulated and heat-resistant. Inside the chamber is an interior source of evaporation which is made up of two separate sources of heat. These sources of heat transfer the evaporation from the metal source onto the substrate material. The computer monitor and controller are two separate components. The computer monitor is used to provide a visual representation of the tool while the controller is used to manipulate and control the various operations of the evaporative deposition asset. It includes several knobs and buttons that allow the user to reset parameters, monitor the model's performance, and change settings. Additionally, there is an independent timer which allows the user to adjust the amount of time for which the equipment operates. STEC LF-310A-EVD is extremely versatile and can be used in a range of deposition processes. The system is also highly accurate and can be used for various applications including mirror coating and dielectric deposition. This makes it an ideal choice for those who need to produce high quality, precision films. It is also environmentally friendly since it uses closed-loop processes which minimize the need for hazardous chemicals and materials. Overall, LF-310A-EVD is a high-performance facility equipment that is specifically designed for applying thin films of metal and dielectric evaporation onto various substrates. It is composed of several components including a chamber, two internal evaporation sources, a computer monitor, and a controller. Its versatility, accuracy, and environmental friendliness makes it an ideal choice for those who require precision substrate films.