Used AIBT / ADVANCED ION BEAM TECHNOLOGY iStar 300 #9211571 for sale

AIBT / ADVANCED ION BEAM TECHNOLOGY iStar 300 is a dual-beam ion implanter and monitor designed for the manufacture of electronic components. AIBT iStar 300 is a highly efficient tool that allows for precise control and accurate implantation of dopants for the production of semiconductor components. This ion implanter and monitor has a wide range of features, including the adjustment of particle beam currents, the monitoring of beam profiles, the automatic optimization of beam current, the adjustment of implant depth, and the adjustment of surface emission. ADVANCED ION BEAM TECHNOLOGY iStar 300 has a powerful ion source that is capable of generating several different ion species depending on the type of material and the application. This allows for a wide range of implantations including boron, arsenic, phosphorus and thallium. IStar 300 also comes equipped with a vacuum pump with a high rate of flow for rapid charge exchange and a pressure gauge for accurate adjustment of the implant parameters. AIBT / ADVANCED ION BEAM TECHNOLOGY iStar 300 is designed to be user friendly and it is equipped with an automated recipe equipment that makes it easy to set up and monitor implantation parameters. AIBT iStar 300 comes with a graphical user interface, allowing for the easy adjustment of parameters such as the beam current, the current spread, the beam profile, the beam convergence, and the beam spectral purity. Additionally, this ion implanter and monitor allows for the adjustment of implant depth and surface emission parameters. ADVANCED ION BEAM TECHNOLOGY iStar 300 is equipped with a variety of diagnostic tools including an ion energy spectrometer, an imaging system for beam characterization, an electrical spectrometer, and an ion depth measurement unit. Additionally, it is capable of monitoring the ion beam current and beam profile with an autopilot machine that allows for continuous monitoring and control of the implant parameters. Overall, iStar 300 is an advanced ion implant and monitor designed to offer a high level of precision, accuracy and performance for the implantation of dopants for the manufacture of electronic components. It features a powerful ion source that is capable of generating a number of different implant types, as well as a variety of diagnostic and monitoring tools. The graphical user interface makes it easy to set up and adjust implantation parameters, allowing users to get the most out of their AIBT / ADVANCED ION BEAM TECHNOLOGY iStar 300 ion implanter.