Used AIBT / ADVANCED ION BEAM TECHNOLOGY iStar #9210937 for sale

AIBT / ADVANCED ION BEAM TECHNOLOGY iStar is a high-precision ion implanter and monitor. It is used for semiconductor fabrication, allowing for precise integration of ions into substrates. This process is crucial for the production of advanced electronics. AIBT iStar uses a horizontal ion beam to implant ions into the substrate. This beam is generated using an ion source chamber and a powerful RF generator. The ion source chamber has an adjustable accelerator voltage and a pair of deflection coils which allow for precision control of the beam. The RF generator uses a unique high voltage set up to generate highly concentrated ion beams. This high concentration gives improved dose accuracy, while the variable accelerator voltage offers a wide range of beam energies. ADVANCED ION BEAM TECHNOLOGY iStar employs a multi-axis scan system to allow for a high degree of flexibility in the implantation process. The scan system uses multiple galvanometers, combined with an ultra-fast controller, to ensure that the beam follows the pattern desired. IStar also includes a set of advanced monitoring tools which detect changes in the ion implantation process. This inform the operator of any possible errors, making the process more reliable. Finally, AIBT / ADVANCED ION BEAM TECHNOLOGY iStar contains a wide variety of safety features to protect both operators and equipment. It is equipped with an emergency-stop system which shuts down the ion beam immediately when danger is detected, while an interlock prevents high energy beams from being released without a proper cooling cycle. A line filter is also contained to reduce the risk of electrical sparking. In summary, AIBT iStar is a powerful benchtop ion implanter and monitor. It offers a precise, flexible and safe implanter process, and is an essential piece of equipment for semiconductor fabrication.