Used AMAT / APPLIED MATERIALS 9200 #9145239 for sale

AMAT / APPLIED MATERIALS 9200
ID: 9145239
Wafer Size: 8"
Vintage: 1999
Spares for implanter, 8" 6 to 8 Inch conversion kit 1999 vintage.
AMAT / APPLIED MATERIALS 9200 Ion Implanter & Monitor is an advanced equipment for implanting ions into a variety of materials. This system provides high-precision ion implantation and precise control of the amount of ion dose delivered to the sample causing minimal implant damage. It is engineered for a wide range of ion sources and can be used for many applications based on the desired implant rate and dose. AMAT 9200 is equipped with a single ion source for the control and implementation of a variety of ion implantation processes that can be customized to the specific substrate. It can handle substrates up to 4 inches in diameter and implant depths up to 8 microns. The unit is designed with a high-performance two-stage procedure to ensure optimum implant results for even the most challenging materials. The two-stage approach allows the user to adjust the implant dose and rate, temperature, and chamber pressure as needed. APPLIED MATERIALS 9200 machine also features an advanced monitoring setup, with real-time voltage and beam port adjustment for superior process control Available monitoring options include surface dose, dose rate, and total dose. Additionally, the tool can detect and analyze backspatter signals to ensure accurate implant depth. 9200 also offers an impressive range of advanced features, such as a user-friendly touchscreen display for simple control of the entire implantation process. It provides a number of safety features to minimize the risk of accidental exposure to radiation and includes a built-in radiation detector for advanced warning. Moreover, AMAT / APPLIED MATERIALS 9200 benefits from an expandable, modular platform that can be equipped with an optional sample loader and mass spectrometer for further customization. Overall, AMAT 9200 is a powerful tool for the efficient and accurate implantation of ions into a variety of substrates. It offers precise control over the implantation process, excellent safety measures, and the ability to expand and customize the asset as needed.
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