Used AMAT / APPLIED MATERIALS 9500xR #293802509 for sale

APPLIED MATERIALS 9500xR is an advanced ion implanter and monitor for high throughput processing. This machine was developed to enable higher performance and improved process control in industrial semiconductor production. It is capable of accurately implanting ions with a variety of energies and beam parameters to multiple depth profiles in a single scan. APPLIED MATERIALS 9500 XR has an advanced beam control equipment which allows optimized dose uniformity, a higher dose rate, and an improved dose stability throughout the process. 9500xR has been designed to support the manufacture of complex, ultra-high-speed electronic devices. It incorporates an advanced planar high-resolution imaging system which is capable of producing detailed slices of the wafer surface at a sub-micron resolution. This images are used to generate high resolution implanter control parameters and beam profiles which allow accurate, uniform ion implantation into the material being processed. 9500 XR also features an advanced configuration unit that allows the operation to be quickly and easily modified to meet the specific requirements of the device being manufactured. The operation status is constantly monitored and any discrepancy or error is immediately detected and corrected. The machine is equipped with a variety of sensors and electrical components which detect the presence of particles, misalignments and other errors as the process is carried out. APPLIED MATERIALS 9500xR also features an advanced optical machine which accurately assesses the material status in the process and constantly monitors ions during the implantation process. Finally, the machine includes an advanced software package which allows for quick and easy integration and operation of the device in an automated production line. APPLIED MATERIALS 9500 XR is an advanced ion implanter and monitor that can provide top-of-the-line performance and process control in the production of highly complex electronic devices. Its advanced beam control tool, configuration asset and optical model provide highly accurate and uniform ion implantation, while its advanced software makes it easy to program and integrate into automated production lines.