Used AMAT / APPLIED MATERIALS 9500xR #9089626 for sale

AMAT / APPLIED MATERIALS / AKT 9500xR Ion Implanter & Monitor is an advanced ion implantation equipment which is capable of performing very accurate and precise implantation operations. This system is capable of implanting ions into a wide range of substrates, such as semiconductors, metal oxides, and non-metallic materials. It is a self-contained unit and can be easily connected to a PC. AKT 9500xR can achieve ion energies up to 500keV and at implantation rates up to 12 pulses/nsec. The ion source on this unit is a high-performance, thermal ion source which produces accelerated ion beams that can be tuned to implant into the desired material. The ion source allows for precise control over the ion energy and the beam current, making it easy to achieve the desired implant profile. The machine also features an Automatic Beam Monitor (ABM) which monitors and records the implant parameters in real-time. This provides a detailed picture of the implantation process and allows for the optimization of the implant conditions. The monitor also includes a graphical user interface which allows for easy manipulation of the implantation parameters, such as dosage, ion energy, and implant rate. The beam monitor also provides feedback to the operator on the beam's condition and allows for easy adjustment of the ion energy to optimize the implant profile. AMAT 9500xR is designed to provide reliable and accurate implantation results in a variety of materials. Its accuracy is achieved through its advanced beam control technology, which enables precise energy control and beam stability. It also features a precise ion deflection tool which provides for precise beam focusing. Additionally, the asset includes several built-in safety features, which prevent operator injury in case of an electrical malfunction. Overall, APPLIED MATERIALS 9500xR Ion Implanter & Monitor is a reliable and sophisticated model offering precise and accurate implantation results. With its advanced beam control technology, high-performance thermal ion source, and detailed graphical interface, it is an ideal choice for applications requiring repeatable and consistent implant profiles.