Used AMAT / APPLIED MATERIALS Extration for xR80 #293671706 for sale

AMAT xR80 is an advanced ion implanter and monitor. This machine is designed to implant ions into substrates such as silicon wafers with extreme accuracy and precision. The xR80 is the most advanced implanter in the xR-Series lineup and features an innovative high and low-energy offering in order to achieve optimum process accuracy and control. It also has an advanced source of ion incident current, which makes it capable of delivering an improved implant uniformity. The xR80 offers precise beam parameters such as spot size, current settings and dwell times as well as the latest jitter rejection technology and closed-loop feedback control. This ensures that ions are implanted into the substrate with high accuracy and repeatability. It also offers an independent beam source of incident current to maximize control of ion implantation uniformity and dose. The xR80 also features an enhanced substrate capability with a wide range of substrate sizes and temperatures as well as an advanced objective lens design that improves uniformity while maintaining a small spot size, particularly at low current values. The xR80 is also equipped with automated process routines that enable precise and repeatable process results. The xR80 also has an extensive range of safety features to minimize the potential for errors and reduce the likelihood of damage to the substrate or molecules. These include a comprehensive set of safeguards and monitoring equipment, on-board machine diagnostics, and an advanced built-in self-test system that can detect faults and alert technicians. Finally, the xR80's automated maintenance and calibration system reduces downtime and ensures the highest level of performance from the machine. In all, APPLIED MATERIALS xR80 is an advanced ion implanter and monitor designed to maximize accuracy and repeatability while minimizing errors and substrate damage. Its high and low-energy settings, advanced beam control, automated process routines, and comprehensive safety features make it the perfect choice for high-precision, high-throughput ion implantation.