Used AMAT / APPLIED MATERIALS PI 9500XR #9228574 for sale
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ID: 9228574
Wafer Size: 6"
Vintage: 1996
Ion implanter, 6"
Utility gas: (Gas name) / Pressure / Flow rate
Ar (Process Ar) / 6.3Kg/cm² / 0.1 SLM
PN2 Process Vent) / 4.2Kg/cm³ / 7 SLM
GN2 (Pneumatics) / 6.3Kg/cm^4 / 2 SLM
Exhaust (Type): Flow rate (CMM) / Size
Beamline / 17, 200 mm
Ion source / 5.66, 110 mm
Fly tube / 5.66, 110 mm
(2) Gas boxes / 5.66, 110 mm
Back & control / 11.3, 200 mm
Cooling water description: Pressure (Kg/cm²) & flow rate temp (« C) & size
Main unit: 4.9, 19-5 20~25, 3/4"
Heat exchanger: 4.9, 37.8, 20-25, 1 1/4"
Cryo compressor: 4.9, 13.5, 20~25, 1/2"
Processor module:
Front door: Cylinder swing type
Flat notch
(5) Cassette trays
Carousal
Cassette indexer
Wafer blade
Hollow gripper arm
Arm position sensor
Orienter sensor
Cleanroom I/F monitor: TFT & lightpen
VME: Mobile cont module
Wheel module:
Wheel std 25 h/sinks, 6" Si coated
Heat sink: 0°C
Standard PFS type
Advance PFS power supply
Standard scan system type
Spin system: DD Motor & motec
Tilt angle: 0~7°C
PFS Gas panel: Ar bleed box
HYT Sensor
Ferro seal flow meter
Source / Terminal module:
Ion source: Bernas type (No ovens)
No vaporizer
Filament P.S
Arc P.S
Extraction P.S
Extraction suppression P.S: Hitek series 1000
Source magnet extended
AMU P.S
Post acceleration P.S
Maximum post voltage: 160 kV
Extraction electrode: Dual bellows
MRS chamber exhaust
Facility module:
DI Water resistance control
Internal heat exchanger system
Facility entry direction: Bottom entry
Gas box module:
Gas box type (4) gas modules
Purge module high pressure (Ar)
Gas module 1 HP (BF3)
Gas module 2 SDS (SiF4)
Gas module 3 SDS
Gas module 4 SDS (AsH3)
Vacuum system:
Source turbo pump: LEYBOLD TMP-11000 C
Source turbo controller: LEYBOLD TMP-11000 C
MRS Turbo pump: LEYBOLD TMP-301
MRS Turbo controller: LEYBOLD
(2) Wheel chamber cryo pumps: CTI Torr-10 on board
(2) Cryo compressors: CTI 9600
Beam line dry pump: EBARA A07 V-B
Processor dry pump: EBARA 40 x20
(2) Gas box exhaust flow switches
(3) Ground lances
Drawings / Manuals
SECS Function
Light tower
Cryo pump removal rails
Control module
Control module: CRT Monitor
No alignment tools
DI Water digital indication
Mains matching transformer: STD Type (STL)
Isolation transformer: STD Type (STL)
Utility configuration:
Maximum extraction voltage: 220 keV
Tool specification: Line power
Maximum controller power: 85 kVA
Circuit breaker: 400 Amp
Input power: 203 VAC, 50/60 Hz, 3 Phase+N
1996 vintage.
AMAT / APPLIED MATERIALS PI 9500XR ion implanter and monitor equipment is a state of the art equipment used in the semiconductor industry. This system incorporates an advanced ion beam source that is designed for precise energy, dose, current and pulse width control, allowing for extremely precise implantation characteristics. The control circuitry used in this unit allows for a user to monitor and adjust parameters as required during an implant process. The 9500XR consists of three major components: the ion beam source, the primary accelerating electrode machine, and the ion beam monitor. The ion beam source is optimized for precisely controlled implantation of ions to provide a controlled and uniform dose of implanted atoms. The primary accelerating electrode tool consists of several electrodes used to control the ions and regulate the current to the implantation site. Finally, the ion beam monitor allows for the ion beam current to be constantly monitored and adjusted as needed. The 9500XR's ion beam source employs a unique three-plate design that enables a higher total beam current and higher implant rates. The source is capable of operating from 1 microampere to 20 kiloamperes and provides beam currents of up to 9 A/cm2. The asset includes an adjustable-aperture ion energy selection device for selecting the desired implant energies. The primary accelerating electrode model utilizes a series of 'IVG' electrodes with varying parameters to precisely control the beam energy and other parameters. The advanced control circuitry used in the equipment allows for a user to monitor and modify parameters during processing to ensure the desired uniformity of the implanted ions. Using the 9500XR's monitor system, implant parameters such as beam current, energy, pulse width, and dose can be monitored in real time. The monitor unit also has probes for measuring beam current, implant energy, and pulse width at the implant site. The machine also incorporates digital feedback control systems that allow the operator to adjust parameters on the fly if needed. Overall, AMAT PI 9500XR ion implanter and monitor tool is a powerful and versatile tool for precise control of ion implantations. This asset offers supreme accuracy in dose and implant energy control, thanks to its three-plate ion beam source, adjustable-aperture ion energy selection device, and advanced control circuitry. The on-site monitor model allows users to monitor and modify parameters in real time during the implantation process. The 9500XR is an invaluable tool for getting the best implant results for integrated circuits.
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