Used AMAT / APPLIED MATERIALS Quantum II #293624738 for sale

AMAT / APPLIED MATERIALS Quantum II
ID: 293624738
Wafer Size: 12"
High current implanter system, 12".
AMAT/AMAT / APPLIED MATERIALS Quantum II Ion Implanter and Monitor is a complete equipment that can be used to perform ion implantation experiments. It allows researchers to implant ions into samples with precision and accuracy. AMAT Quantum II is designed to implant ions into materials such as silicon, gallium arsenide (GaAs), and other semiconducting materials. Its features include a powerful ion source and ion beam monitor, large beam extraction window, high resolution and accuracy, wide choice of ion implantation materials, and support for multiple handle wafer types. APPLIED MATERIALS Quantum II can produce beams of ions for implantation of multiple materials. It is equipped with an ion source that is designed to supply ions with a high degree of accuracy and reliability. The ion source is capable of producing ion energies from 10 keV to 300 keV. It is also capable of producing a wide range of ion currents, ranging from 0.25 mA to 180 mA, with a maximum dose per pulse of 10 mC/cm 2. All this can be controlled by a sophisticated control system that includes a graphical user interface, allowing for flexible and easy control of the unit. The ion beam current is monitored with an ion beam monitor, providing high resolution, accuracy, and fast response. The ion beam monitor also helps to characterize the collected ions and determine their energies, allowing for tailored implantation. Additionally, the monitor includes several safety features, like automatic shutoff, diagnostic alarms and shutdown if needed, providing extra peace of mind when operating the machine. Quantum II is equipped with a large beam extraction window that can be used to extract the implanted ions from samples and can be individually configured for the application. Additionally, it has a wide choice of ion implantation materials from which a researcher may choose, in order to tailor their study. Finally, the tool is designed to work with multiple handle wafer sizes, from a 25mm to 150mm. APPLIED MATERIALS/AMAT / APPLIED MATERIALS Quantum II Ion Implanter and Monitor is a reliable and powerful tool for performing ion implantation experiments. With its powerful ion source and ion beam monitor, large beam extraction window, high accuracy, and support for multiple handle wafer types, it is ideal for researchers and laboratories looking to perform high accuracy and precision experiments.
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