Used AMAT / APPLIED MATERIALS Quantum Leap 3 #9192602 for sale

AMAT / APPLIED MATERIALS Quantum Leap 3 (QL3) is an advanced ion implanter and monitor for semiconductor production. This machine combines exceptional performance with operational efficiency and cost savings. With a maximum energy range of 25 to 400 kiloelectron volts (keV), the QL3 delivers highly accurate implantation and performance results. It is a highly reliable and robust machine, designed for extended operation in a clean room fabrication environment. AMAT Quantum Leap 3 is capable of satisfying the needs of many advanced semiconductor processes. It features high throughput capabilities and precision ion beam manipulation, coupled with advanced beam control technology, for maximum efficiency. The enhanced beam control allows for better stability and improved accuracy, particularly in respect to implant uniformity. Furthermore, the highly configurable platform allows for total optimization of each and every implant process. The QL3 ion implantation system is powered by a specifically designed hardware and software architecture. The implanter is equipped with a powerful processor for fast processing speeds of large instructions sets and long job runs. The software gives operators precise control over the implant and monitor parameters, enabling them to optimize the implant parameters for the most accurate results. The QL3 is composed of two distinct components, the ion implanter and the monitor. The ion implanter is a high-voltage, low-pressure device that accelerates metal ions into the wafer substrate. It consists of multiple stages, such as accelerating electrodes, focusing optics, plasma source, ion source, and an overall containing under vacuum. The monitor utilizes state-of-the-art scanning probe microscopy to monitor and verify the ion implantation process. Finally, the ion implanter and monitor feature advanced diagnostic capabilities. This allows for in-depth analysis of the implant process. Furthermore, these tools can be used for preventive maintenance, process optimization, and other tasks related to ion implantation. APPLIED MATERIALS Quantum Leap 3 system ensures the highest level of performance and reliability for semi-conductor production.