Used AMAT / APPLIED MATERIALS Quantum Leap II #293755366 for sale

ID: 293755366
Wafer Size: 12"
Vintage: 2002
Ion implanter, 12" Process: Low energy implant FOUP Factory interface Quantum leap implanter NOVAPURE egs237 scrubber Heat exchanger CIM 2002 vintage.
AMAT / APPLIED MATERIALS Quantum Leap II is an ion implanter & monitor designed for wafer processing. It enables device manufacturers to achieve higher-quality semiconductor devices at a reduced cost and with less energy consumption. The machine is capable of implanting both energetic and non-energetic species with up to 40MeV beam energy, and can monitor particle microdosimetry on real-time basis. AMAT Quantum Leap II is designed for ease of use, with an intuitive graphical user interface and advanced recipe capability for recipe management. It also features an integrated particle removal controller to ensure a high-quality implant. In addition, the system has a high-resolution imaging monitoring system which uses advanced pattern recognition algorithms to accurately control the profile of the implanted species. The implantation power of APPLIED MATERIALS Quantum Leap II is provided by a high-efficiency power supply stage that delivers up to 60A of power. This stage is complemented by an integrated ion source chamber, built to the same standards as AMAT Ion Implantation Technology. This allows for optimal ion spawn patterning and beam extraction efficiency. In order to achieve maximum process control and uniformity of implantation, Quantum Leap II features a patented beam monitoring microscope. This microscope monitors beam intensity, profile, and particle fluence on a real-time basis. A special advanced beam control panel allows the user to precisely adjust parameters such as beam emittance and implant parameters for optimal process performance. In addition, AMAT / APPLIED MATERIALS Quantum Leap II offers a host of advanced features such as chamber contamination monitor, high throughput and high-end precision process control. Its unique loading magazine enables users to conveniently load up to 3000 wafers per day into the implant chamber, allowing for flexible implantation and process optimization. AMAT Quantum Leap II is a powerful and versatile tool for device manufacturers looking to achieve higher-quality devices at reduced cost. With its intuitive user interface and advanced features, it enables them to achieve superior process control results and world-class product quality.
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