Used AMAT / APPLIED MATERIALS Quantum Leap II #9051278 for sale

AMAT / APPLIED MATERIALS Quantum Leap II is an advanced ion implanter and monitor that provides a comprehensive and capable solution for all types of ion implantation processes. AMAT Quantum Leap II has a wide range of capabilities including ion implantation, ion beam measurement, and implantation process control. This versatile equipment makes it possible to speed up implantation throughput, while providing precise and reliable control over the implantation process. APPLIED MATERIALS Quantum Leap II provides a fast and simple way to set up, monitor, and control the ion implantation process. This system is designed to provide an efficient workflow while keeping the entire unit in a closed loop with automatic adjustments and monitoring. The machine is designed to provide precise implantation results and the ability to adjust the combination of ion impurity and implantation energy for maximum throughput and quality control. Quantum Leap II is capable of operating at a high ion implantation rate over an adjustable range of 0.01-2.0 keV. This tool is also able to process multiple wafers simultaneously with optimal energy and doping profiles. This asset is able to accurately control the beam emission parameters such as beam repetition rate, beam shape, beam current, and total beam dose. AMAT / APPLIED MATERIALS Quantum Leap II offers a variety of monitoring capabilities including energy and profile scans, ionization monitoring, and current measurement. This model also provides real-time monitoring of the implantation process, giving users the ability to make adjustments as needed. Additionally, AMAT Quantum Leap II can be used to monitor and adjust the implants as the wafers move through the implantation stage. Finally, APPLIED MATERIALS Quantum Leap II offers a range of advanced software solutions for controlling and monitoring the implantation process, as well as recording and analyzing measurements and results. With these features, users are able to provide better product quality, to ensure the results are accurate and consistent. The software solutions also allow for faster response times when making adjustments or corrections during the implantation process. This equipment offers a comprehensive solution for all types of ion implantation processes.