Used AMAT / APPLIED MATERIALS Quantum Leap III #9066908 for sale
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ID: 9066908
Wafer Size: 8"
High current ion implanter, 12"
Mini E: Felcon unit fitted, No UCAS
MMTX
VME
Light tower fitted
Post Accel QIII Type
Tilt: +/- 15º
Scan and beamstop mods
QIII ABM Option fitted
(6) Positions gas panel
(1) High pressure toxic module
Source: QIII with (4) pins connector
IHC Chassis: Single Arc PSU
DSP Type: 0100-00838
Tetrode version:
Surge R: 9090-01382
PSU: 1140-00161 (A1028760)
Extraction area:
EVR fitted
Delate: 0100-01445
Pre Accel PSU: 9090-00397ITL
Leybold Mag drige Digital controller
VME & Main PDU Side
On-board CTI Cryo controller
Pumps removed
CE-Marked.
AMAT / APPLIED MATERIALS Quantum Leap III is an advanced dual-beam, high current ion implanter and monitor, capable of providing precise and reliable implantation of ions over a wide range of substrate materials. At its core, AMAT Quantum Leap III utilizes beamline and ion-source technologies, coupled with advanced beam and source treatments, to provide highly accurate and precise implantation of ions into substrate materials. This focused ion energy and implantation current allows for wide range implantation at the same time. The various beamline components utilized by APPLIED MATERIALS Quantum Leap III are designed to optimize the rate and accuracy of the ion implantation process. The beamline, including the ion source, beam control unit, beam deflection unit, and optimized optics, are all optimized to provide the best possible ion implantation for a wide range of substrate materials, including metals, semiconductors, and polymers. This powerful combination of beam and source components allows Quantum Leap III to deliver implantation current ranging from just tens of nanoamps, to tens of kiloamps, all depending on the desired implantation process results. In addition to its beam and source components, AMAT / APPLIED MATERIALS Quantum Leap III is also equipped with a monitor to provide real-time data on the ion implantation process. The monitor, which consists of a chamber control unit and advanced diagnostics, showcases the various parameters such as implantation current, energy, and depth of the implantation. This allows users to view implantation behavior in real-time, allowing for immediate insights or changes to be made if needed. This feature has already been proven to be incredibly useful for improving implantation accuracy and performance. AMAT Quantum Leap III Ion Implanter and Monitor is a highly efficient and effective system, designed to provide a quality and reliable implantation process to a wide range of substrate materials. Its advanced combination of beamline components, monitor, and diagnostics, provide users with precise, powerful implantation, plus real-time datas so users can adjust or optimize the process as desired.
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