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AMAT / APPLIED MATERIALS Quantum X
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ID: 9190767
Wafer Size: 12"
Ion implanter, 12".
AMAT / APPLIED MATERIALS Quantum X is an advanced ion implanter and monitor designed for maximum productivity in modern semiconductor fabrications. It combines the latest advances in ion implantation technology and state-of-the-art control systems to offer superior performance and an unprecedented level of process control. AMAT Quantum X utilizes a super-heated magnetron for both plasma source and ionization chamber. The super-heated magetron allows for a constant ionization temperature, increased controllability and speed, and precise control over the angle, number, and spread of the ion beam. This ensures more consistent ion implantation results and a much tighter ion beam profile than previous systems. APPLIED MATERIALS Quantum X utilizes a high-precision robotic arm for an improved substrate handling system. With its advanced robotics and control systems, it is able to change implant positions and pathways with little to no time required for recalibration. This also reduces setup time and eliminates the possibility of misalignments or other errors often associated with manual ion implantation. Quantum X comes equipped with the latest in control systems and a vast range of automated settings. This allows advanced process parameters to be set and monitored, while ensuring that only the highest quality samples are produced. The system is capable of running multiple implant programs, with each program able to process both bundled and split-dose samples. The system also allows for multiple providers of implanted material, allowing for flexibility in the choice of materials used. AMAT / APPLIED MATERIALS Quantum X is designed to provide a highly efficient and cost-effective implantation process, as well as a comprehensive platform for process control and monitoring. Its advanced automation and process control systems, coupled with superior performance and the ability to handle multiple processes, make AMAT Quantum X the leading choice for modern semiconductor fabrication.
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