Used AMAT / APPLIED MATERIALS Quantum X #9225919 for sale

AMAT / APPLIED MATERIALS Quantum X is a high-powered ion implanter and monitor combination equipment. This system is designed to facilitate the efficient implantation and monitoring of ion implants for semiconductor device fabrication. This combination unit consists of a high-energy ion implanter as well as an Optical Emission Spectrometer (OES) for measurements of ion doping level during implantation. AMAT Quantum X implanter can accommodate multiple ion sources, including boron, boron compounds, carbon, nitrogen, phosphorus, arsenic, antimony, and other dopants. It has a wide range of energy levels and ions mass, with adjustable beam concentricity for up to 350 keV and 10-25µm spot sizes. It also features a RF-protected vacuum chamber, enabling the implantation of highly sensitive compounds. Additionally, it utilizes an advanced closed-loop control machine to ensure precise control of material deposition. The OES component of the tool facilitates real-time measurements of ion doping levels during implantation. Utilizing a two-channel optical spectrometer with an extended detection range from 185nm to 1000nm, the OES measures active concentrations of dopants while ensuring high signal sensitivity and repeatability. Additionally, embedded algorithms can identify and report instabilities in the implant process parameters to quickly identify and address implant anomalies. The combination of the high-powered ion implanter and optical emission spectrometer makes APPLIED MATERIALS Quantum X an ideal choice for the high-throughput fabrication of advanced IC devices. By allowing rapid and precise implantation and measurement of ion doping levels, it reduces process variability and improves device yield. It also offers an easy-to-use graphical user-interface (GUI) that assists with programming, monitoring and data logging. To ensure reliable operation, Quantum X includes several safety features such as ion-source triggering and remote shutoff. With its robust design and built-in performance monitoring asset, AMAT / APPLIED MATERIALS Quantum X can be integrated with various advanced plasma etch and deposition processes. Its durability and flexibility make it the ideal implant model for semiconductor device and MEMS fabrication.