Used AMAT / APPLIED MATERIALS / VARIAN VIISta HCP+ #293827340 for sale

ID: 293827340
Wafer Size: 12"
Vintage: 2007
High current ion implanter, 12" (4) Load Ports Linear Track (6) BROOKS AUTOMATION Dual arm robots DBM2706-V2 Robot controller Signal tower (4 Lights) Monitor Keyboard E/S module: Platen Roplat E-Clamp PSU 6A51 IAN Computer 6A51 NCS Computer 6A26 HV PSU 6A37 Turbo PSU Decel 2 PS control 6A50 Transport module control 6A49 TMC amplifier assembly Dual Head OFG power supply 6A Pneumatic interface On BOARD Cryo control CTI IS Control 6A11 Process module control 6A14 PMC amplifier assembly 6A13 Dual PFG PS Control 6A16 PFG PSU (4) 6A Analog / Digital I/O Interfaces Trek 681B 6A Chuck PSU Process module controller I/V Facilities module: 7A4 Pneumatics interface 7A5 Main PD Interface 7A7 DI PS Control GLASSMAN 7A8 HV PSU SERIES 1000 7A9 HV PSU Exhaust conductivity monitor control 7A15 Signal tower controller MGE UPS systems UPS Analyzer Magnet 90 deg module: LAMBDA 2A1 Genesys DC PSU LAMBDA / EMI 2A2 ESS PSU 2A3 Analog / Digital I/O Interface 2A 2 Axis motor control 2A5 Analog / Digital I/O Interface 2A Decel 1 Suppression PSU controller 2A 90 Magnet PS Control 2A8 Analog / Digital I/O Interface 2A Beamline pneumatics interface 2A Analyzer corrector magnet 2A PS Interface 2A Vacuum pump interface EDWARDS SCU-1500 2A Turbo controller X2 2A Source magnet PSU 2A Source magnet PS control 2A Analog / Digital I/O Interface 2A Analog / Digital I/O Interface 2A Manipulator control SERIES 1000 SRC Suppression power supply Setup cup controller monitor Filament power supply Quad Magnet polarity switch Decel -1 Focus power supply Source suppression P.S controller Analyzer magnet: Rod controller Rod controller PSU Decel 2 Suppression PSU Control Decel 2 Suppression PSU Decel 2 Focus PSU 70 Magnet PS control Analyzer corrector magnet PSU X6 Analog / Digital I/O Interface 3A Multipole PSU 3A Rod controller down Source: Head, Bushing, Electrode Gas cab: Gas modules: Pos 1 HP Argon CGA 530 (MFC: 1600) Pos 2 SDS BF3 1/4 VCR (MFC: 1662) Pos 4 SDS GeF4 1/2 VCR (MFC: UFC-1663) Pos 3 SDS AsH3 1/2 VCR (MFC: GF120XSL) Gas cab control: (3) UNIVERSAL 1A22 to 24 Analog/Digital I/O Interfaces 1A20 Source isolation controller LAMBDA Programmable supply TDK / LAMBDA Programmable supply TDI Filament PSU LAMBDA EMI ESS PSU Gas box power distribution Vacuum system: Roughing pump EBARA A10S Roughing pump beamline and source EBARA A10S-B Roughing pump load lock (2) CTI IS-1000 Cryo compressors Others: CVCF assembly VESDA Chiller Transformer 2007 vintage.
AMAT / APPLIED MATERIALS / VARIAN VIISta HCP+ is a renowned ion implanter and monitoring equipment widely used in the semiconductor industry for high-current implantation processes. This advanced tool is a staple in semiconductor manufacturing facilities due to its exceptional performance, precision, and reliability in ion implantation applications. One of the key features of AMAT VIISta HCP+ is its versatility and capability to perform a wide range of implantation processes with high accuracy and repeatability. The system is designed to handle various materials and implantation ions, making it suitable for a diverse range of semiconductor manufacturing requirements. Whether it is for doping, annealing, or other ion implantation processes, VARIAN VIISta HCP+ offers unmatched flexibility and efficiency. APPLIED MATERIALS VIISta HCP+ is equipped with state-of-the-art technology and components that enable precise control and monitoring of the ion implantation process. The unit features advanced beamline components, including ion sources, beamline optics, and energy analyzers, that work together seamlessly to ensure the delivery of ions with the desired energy and dose into the semiconductor substrate. This level of control is crucial for achieving uniform and reproducible implantation results across a batch of wafers. Furthermore, VIISta HCP+ is equipped with sophisticated monitoring and feedback mechanisms that allow real-time monitoring of the implantation process. The machine continuously monitors key parameters such as beam current, energy, dose, and beam shape to ensure optimal performance and process stability. Any deviations from the set parameters are quickly detected and corrected, ensuring consistent and high-quality implantation results. In addition to its performance and monitoring capabilities, AMAT / APPLIED MATERIALS / VARIAN VIISta HCP+ boasts a user-friendly interface and intuitive software that simplifies operation and data analysis. Operators can easily set up implantation recipes, adjust process parameters, and monitor the progress of the implantation process through the tool's user interface. The software also offers data logging and analysis tools that facilitate process optimization and data management. Moreover, AMAT VIISta HCP+ is designed with a focus on reliability and uptime, crucial factors in semiconductor manufacturing environments where any downtime can have significant cost implications. The asset features robust construction, high-quality components, and efficient maintenance procedures that minimize the risk of model failures and maximize productivity. Routine maintenance tasks are streamlined, and preventive maintenance schedules are in place to ensure the long-term performance and longevity of the equipment. Overall, VARIAN VIISta HCP+ ion implanter and monitoring system represents a cutting-edge solution for semiconductor manufacturers seeking precise, reliable, and versatile ion implantation capabilities. With its advanced technology, exceptional performance, and user-friendly design, APPLIED MATERIALS VIISta HCP+ is a valuable asset in the production of high-quality semiconductor devices. Whether it is for research and development or high-volume manufacturing, this unit delivers consistent and repeatable implantation results that meet the stringent demands of the semiconductor industry.
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