Used AMAT / APPLIED MATERIALS / VARIAN VIISta HCP+ #293827340 for sale
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ID: 293827340
Wafer Size: 12"
Vintage: 2007
High current ion implanter, 12"
(4) Load Ports
Linear Track
(6) BROOKS AUTOMATION Dual arm robots
DBM2706-V2 Robot controller
Signal tower (4 Lights)
Monitor
Keyboard
E/S module:
Platen
Roplat
E-Clamp PSU
6A51 IAN Computer
6A51 NCS Computer
6A26 HV PSU
6A37 Turbo PSU
Decel 2 PS control
6A50 Transport module control
6A49 TMC amplifier assembly
Dual Head OFG power supply
6A Pneumatic interface
On BOARD Cryo control
CTI IS Control
6A11 Process module control
6A14 PMC amplifier assembly
6A13 Dual PFG PS Control
6A16 PFG PSU
(4) 6A Analog / Digital I/O Interfaces
Trek 681B 6A Chuck PSU
Process module controller I/V
Facilities module:
7A4 Pneumatics interface
7A5 Main PD Interface
7A7 DI PS Control
GLASSMAN 7A8 HV PSU
SERIES 1000 7A9 HV PSU
Exhaust conductivity monitor control
7A15 Signal tower controller
MGE UPS systems UPS
Analyzer Magnet 90 deg module:
LAMBDA 2A1 Genesys DC PSU
LAMBDA / EMI 2A2 ESS PSU
2A3 Analog / Digital I/O Interface
2A 2 Axis motor control
2A5 Analog / Digital I/O Interface
2A Decel 1 Suppression PSU controller
2A 90 Magnet PS Control
2A8 Analog / Digital I/O Interface
2A Beamline pneumatics interface
2A Analyzer corrector magnet
2A PS Interface
2A Vacuum pump interface
EDWARDS SCU-1500 2A Turbo controller X2
2A Source magnet PSU
2A Source magnet PS control
2A Analog / Digital I/O Interface
2A Analog / Digital I/O Interface
2A Manipulator control
SERIES 1000 SRC Suppression power supply
Setup cup controller monitor
Filament power supply
Quad Magnet polarity switch
Decel -1 Focus power supply
Source suppression P.S controller
Analyzer magnet:
Rod controller
Rod controller PSU
Decel 2 Suppression PSU Control
Decel 2 Suppression PSU
Decel 2 Focus PSU
70 Magnet PS control
Analyzer corrector magnet PSU
X6 Analog / Digital I/O Interface
3A Multipole PSU
3A Rod controller down
Source: Head, Bushing, Electrode
Gas cab:
Gas modules:
Pos 1 HP Argon CGA 530 (MFC: 1600)
Pos 2 SDS BF3 1/4 VCR (MFC: 1662)
Pos 4 SDS GeF4 1/2 VCR (MFC: UFC-1663)
Pos 3 SDS AsH3 1/2 VCR (MFC: GF120XSL)
Gas cab control:
(3) UNIVERSAL 1A22 to 24 Analog/Digital I/O Interfaces
1A20 Source isolation controller
LAMBDA Programmable supply
TDK / LAMBDA Programmable supply
TDI Filament PSU
LAMBDA EMI ESS PSU
Gas box power distribution
Vacuum system:
Roughing pump
EBARA A10S Roughing pump beamline and source
EBARA A10S-B Roughing pump load lock
(2) CTI IS-1000 Cryo compressors
Others:
CVCF assembly
VESDA
Chiller
Transformer
2007 vintage.
AMAT / APPLIED MATERIALS / VARIAN VIISta HCP+ is a renowned ion implanter and monitoring equipment widely used in the semiconductor industry for high-current implantation processes. This advanced tool is a staple in semiconductor manufacturing facilities due to its exceptional performance, precision, and reliability in ion implantation applications. One of the key features of AMAT VIISta HCP+ is its versatility and capability to perform a wide range of implantation processes with high accuracy and repeatability. The system is designed to handle various materials and implantation ions, making it suitable for a diverse range of semiconductor manufacturing requirements. Whether it is for doping, annealing, or other ion implantation processes, VARIAN VIISta HCP+ offers unmatched flexibility and efficiency. APPLIED MATERIALS VIISta HCP+ is equipped with state-of-the-art technology and components that enable precise control and monitoring of the ion implantation process. The unit features advanced beamline components, including ion sources, beamline optics, and energy analyzers, that work together seamlessly to ensure the delivery of ions with the desired energy and dose into the semiconductor substrate. This level of control is crucial for achieving uniform and reproducible implantation results across a batch of wafers. Furthermore, VIISta HCP+ is equipped with sophisticated monitoring and feedback mechanisms that allow real-time monitoring of the implantation process. The machine continuously monitors key parameters such as beam current, energy, dose, and beam shape to ensure optimal performance and process stability. Any deviations from the set parameters are quickly detected and corrected, ensuring consistent and high-quality implantation results. In addition to its performance and monitoring capabilities, AMAT / APPLIED MATERIALS / VARIAN VIISta HCP+ boasts a user-friendly interface and intuitive software that simplifies operation and data analysis. Operators can easily set up implantation recipes, adjust process parameters, and monitor the progress of the implantation process through the tool's user interface. The software also offers data logging and analysis tools that facilitate process optimization and data management. Moreover, AMAT VIISta HCP+ is designed with a focus on reliability and uptime, crucial factors in semiconductor manufacturing environments where any downtime can have significant cost implications. The asset features robust construction, high-quality components, and efficient maintenance procedures that minimize the risk of model failures and maximize productivity. Routine maintenance tasks are streamlined, and preventive maintenance schedules are in place to ensure the long-term performance and longevity of the equipment. Overall, VARIAN VIISta HCP+ ion implanter and monitoring system represents a cutting-edge solution for semiconductor manufacturers seeking precise, reliable, and versatile ion implantation capabilities. With its advanced technology, exceptional performance, and user-friendly design, APPLIED MATERIALS VIISta HCP+ is a valuable asset in the production of high-quality semiconductor devices. Whether it is for research and development or high-volume manufacturing, this unit delivers consistent and repeatable implantation results that meet the stringent demands of the semiconductor industry.
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