Used AMAT / APPLIED MATERIALS Wheel for 9500 #9261936 for sale

AMAT 9500-Wheel is an ion implanter and monitor used in semiconductor manufacturing processes. This advanced technology is ideal for high-powered implantation processes. The 9500-Wheel is designed to implant ions into the wafers and monitor the speed, uniformity, and dose of the implanting. The wheel is composed of a base wheel and a set of charged particle source modules. The 9500-Wheel utilizes a multi-arc ion implanter to inject ions into the wafers. This ion implanter and monitor can be used for a variety of back-end semiconductor production processes including implantation, coating, and sputtering. The 9500-Wheel is designed for high performance with an ion implanter using a multi-arc arrangement scheme that enables precise implantation. This arrangement allows the user to generate and inject high doses of ions, ensuring uniform ion distribution and accuracy. The wheel has a multi-source design that allows for the user to independently control the emission current, source current, and ion current for each individual source. Additionally, the wheel can be adjusted according to the needs of each individual process. The equipment offers flexible control of the ion beam position and divergence, as well as providing torque compensation to maintain uniform coverage. The 9500-Wheel has a wide range of ion sources available depending on the application. This system is designed to offer both standard and enhanced ion sources. Standard ion sources provide general implantation with a wide range of ion energies from low to high. The enhanced ion sources provide high dose and uniformity, which are critical for modern ion implantation processes. Additionally, the unit is equipped with a multi-channel pore detection machine which can accurately detect the presence of pores in the material being implanted. The 9500-Wheel also offers a range of monitoring features. Its advanced monitoring tool is designed to monitor the entire implantation process, from source preparation to implantation. This asset provides insights into what needs to be adjusted in the process to ensure a successful implant. The model is designed to monitor important parameters such as ion dose, implant angle, and wafer temperature. Additionally, the monitor also provides feedback on the source stability, beam profile, and source position. Overall, APPLIED MATERIALS 9500-Wheel is a powerful tool for advanced ion implantation and monitoring processes. This ion implanter and monitor offers a wide range of features and capabilities for efficient and accurate processes. The 9500-Wheel is designed to provide consistent, uniform implantation at high doses, making it an ideal solution for modern semiconductor production processes.