Used AMAT / APPLIED MATERIALS xR80 Leap II #9329404 for sale
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ID: 9329404
Wafer Size: 8"
Vintage: 2002
High current implanter, 8"
Processor module
Beamline module
Source services module
Processor rack
Mobile PC and desktop
Clean room PC
Signal tower
TEM Probe
ISO TX
Mains matching TX
Beamline controllers PSU's and assy:
Pre accel / Mag controller
Beamline Inst
Vacuum controller
Turbo controllers
Focus PSU
Decel PSU
A Mag PSU
Pre A converter PSU
Source mag PSU
Suppression PSU
Beam path components source / Extraction / Flight tube / MRS and PFS assy:
Source head type: IHC
Extraction type: Dual bellows
Flight tube
MRS
Pre-defining
PFS Type: HD
Control system: MOTOROLA 68040 Series
PC based operator interface
Gas cabinet:
SDS Module: AsH3 (SDS) / PH3 (SDS) / BF3 (SDS) / SDS
Purge Module
PSU's Controllers and assy:
Gas and temperature controller
Filament PSU
Arc PSU
Bias PSU
DPS
Pre A HV stack
G2 PSU, 8"
Source ISO TX
Vacuum system:
LEYBOLD 1000C Turbo pump
LEYBOLD 361C MRS Turbo pump
LEYBOLD Turbotronik NT20 Turbo pump controllers
EDWARDS QDP40 Beamline dry pump
CTI-CRYOGENICS OB -10 Side cryo pump
CTI-CRYOGENICS OB -10 Rear cryo pump
CTI-CRYOGENICS 9600 Side cryo compressor, 220 V
CTI-CRYOGENICS 9600 Rear cryo compressor, 220 V
Processor PSU's controller and assy:
Wheel and components
Spin motor
Gripper
Transfer arm
Clip actuator
Blade
A/B Sensor
Tilt assy, 0-7°
PFS DP Box
Beam stop
Beam profiler
Filament PSU (PFS)
Wafer loader:
Carousel
Indexer
W/L Door
Oriented
Cassettes / Trays: (3) Trays
Arm servo PSU
Arm servo controller
Control Rack:
DAQ PDU
Option chassis
Target system installer
W/L Controller
W/L Vacuum
Ground PDU
Target system vacuum
Spin / Scan controller
Direct drive interface
Plasma flood chassis
Amp scanner
Amp spinner
Spin / Scan PDU
Bleed resistor
VME:
CPU Main board
Loop controller
Tetrode source head
80 keV Stack with resistors on top
G2 Power supply side of gas cabinet
G2 Resistor next to source head
Source transformer
ISO Transformer W/L area
Larger beam / Stop
Decal chassis under B/line
HD PFS
Operating system: Windows NT
2002 vintage.
AMAT / APPLIED MATERIALS xR80 Leap II is a pre-fabricated ion implanter and monitor. This piece of equipment is specifically designed for the implantation and monitoring of very small substrate sizes, such as wafer chips used in semiconductor manufacturing. The Leap II is capable of high throughput implantation and real-time monitoring. The primary feature of the Leap II is its ability to operate with a variety of implant gases and dopant materials. Using the xR80 platform, the Leap II is capable of precise implants at temperatures as low as -100°C. It has an energy range of up to 800 keV which allows for greater control of the implantation process. Additionally, the Leap II has an extremely efficient mechanical cool-down equipment that allows for a faster warm-up and cool-down times. This allows for shorter cycle times and a more efficient process. The Leap II also features a high-resolution digital imaging system to perform inline substrate imaging to ensure the accuracy of the implantations. This unit uses a CCD camera to capture high-resolution digital images of the substrates, allowing for accurate process control. This monitoring machine provides real-time feedback for process optimization. The Leap II has an advanced wafer-monitoring tool which combines advanced mechanical, optical, and electrical components to provide accurate measurements of various parameters during implantation. This monitoring asset can detect potential errors and help prevent them from occurring. The Leap II's unique xR80 platform also has integrated control software that provides enhanced process tracking and control. This software allows for better process optimization and process traceability and can be customized for specific process or application needs. In addition to the high-performance waft analysis and process control systems, the Leap II also features a high-end robotic model for automated installations. This robotic equipment can be used to perform even the most complex installations, allowing for further process control and increased efficiency. Overall, AMAT xR80 Leap II is a powerful pre-fabricated ion implanter and monitor that provides efficient implantation and real-time substrate analysis. Its advanced control software allows for process traceability and the integrated robotic system provides automated installations. This unit is perfect for semiconductor chip manufacturers looking for efficient and precise implantations.
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