Used HITACHI IP825A #293630417 for sale

HITACHI IP825A is designed for efficient, high-precision ion implantation and monitoring in microelectronic device fabrication processes. The equipment combo set consists of two modules—an ion implanter and radiation monitor. Providing the best performing ion implantation and monitoring of microelectronic devices, the highly reliable IP825A is capable of reaching high-precision implantation with an exceptionally high dynamic range compared to existing systems. It features an impressive resolution ratio of 1:500 and a scanning speed of up to 120°/sec. This allows for more efficient implantation processes and better yield delivery. The ion implanter module facilitates various processes, including implantation of Ar+, Xe+, Ni+, O+, B+, and N+ particles, as well as ion etching. It also has a built-in charge-compensated system that reduces charged particles from implantation. Meanwhile, the radiation monitor module helps maintain a high-precision environment by continuously monitoring the implantation conditions and ensuring quality performance. It features a scanning window size of up to 12mm that ensures a more precise measurement of the particle beam parameters. It also utilizes a unit map to analyze and monitor the beam angle, beam spot size, and more, which drastically boosts the process efficiency. Plus, the machine controls both instruments in one flexible program. This makes it easy to manipulate the implantation tool's parameters while simultaneously analyzing the monitored data in real time. The asset can also save data and recall it in a systematic manner. The model features an intuitive graphical user interface (GUI) that simplifies the control and monitoring of the implants. The 4.3-inch color LCD panel is designed for fast, easy viewing. It is also designed for long-term reliability and boasts a 90-day standby cycle. HITACHI IP825A combo set is suitable for a wide range of microelectronic device fabrication processes. The advanced functions and user-friendly operations allow for effective monitoring and implantation operations. This ensures quality results and increased throughput.