Used IBS MAXion #293808794 for sale
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ID: 293808794
Wafer Size: 6"-8"
Ion implanter, 6"-8"
Source lifetime: > 1050 h
Silicon: 210 keV
Substrate size: 4"-8"
Tilt: 0-7°
Uniformity: ≤ 0.5 %
IHC Source
High throughputs: 3 / 5 Cassettes
Temperature control: <75°C.
IBS MAXion is a cutting-edge ion implanter and monitor equipment developed by IBS Precision Engineering, a leading provider of precision manufacturing and technology solutions. This advanced system is designed to meet the demanding requirements of the semiconductor industry for ion implantation processes used in the fabrication of integrated circuits. MAXion ion implanter and monitor unit incorporates state-of-the-art technology and innovative features to provide exceptional ion implantation performance and process control capabilities. It is equipped with high-quality components and advanced algorithms to ensure precision, reliability, and efficiency in ion implantation processes. One of the key features of IBS MAXion machine is its advanced ion source technology, which enables the generation of highly energetic ion beams with precise control over beam energy, current, and distribution. The tool is capable of implanting a wide range of ion species with high accuracy and consistency, allowing for the precise doping and modification of semiconductor materials during the fabrication process. MAXion asset also features a sophisticated beamline design that minimizes beam divergence, reduces beam losses, and enhances beam quality, resulting in improved implantation uniformity and process repeatability. The model is equipped with advanced beam diagnostics and monitoring tools to ensure optimal beam performance and process control throughout the ion implantation process. In addition to its advanced ion source and beamline technology, IBS MAXion equipment is integrated with a user-friendly control interface and software platform that allows for easy operation, real-time monitoring, and data analysis. The system provides comprehensive process visualization, data logging, and recipe management capabilities to optimize process parameters, improve productivity, and ensure consistent implantation results. MAXion unit is designed for flexibility and scalability, allowing for easy integration into a wide range of semiconductor production environments. It can be configured with multiple ion sources, beamline configurations, and vacuum systems to accommodate different implantation requirements and process specifications. Furthermore, IBS MAXion machine is engineered with robustness and reliability in mind, featuring high-quality components, advanced safety features, and rigorous quality control measures to ensure long-term performance and operational stability. The tool is designed for 24/7 continuous operation, with minimal maintenance requirements and downtime to maximize productivity and uptime. In conclusion, MAXion ion implanter and monitor asset represents a state-of-the-art solution for ion implantation processes in the semiconductor industry. With its advanced technology, precision performance, user-friendly interface, and robust design, IBS MAXion model offers manufacturers a reliable and efficient solution for achieving high-quality ion implantation results in the fabrication of integrated circuits.
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