Used KLA / TENCOR / THERMA-WAVE LSS-20SLAT #293646283 for sale

ID: 293646283
Ion implanter Beam diameter: 0.68mm ± 5% Beam divergence: 1.05mrad Wave length: 488nm Maximum drift: <2.0% Minimum air flow cooling: <50cfm Expected lifetime: >20,000 Electrical power: Up to 60W Output power: 50mW.
KLA / TENCOR / THERMA-WAVE LSS-20SLAT is an advanced ion implanter and monitor equipment used to create microstructural changes in semiconductor devices. This is achieved by introducing controlled amounts of charge carriers (either electrons or ions) to the material. The ion implanter is typically used in the manufacture of advanced semiconductor devices and integrated circuits. KLA LSS-20SLAT uses a linear accelerator to inject the charge carriers into the material. The ion beam is then shaped and focused into a beam of uniform energy by a multi-element magnet system. This ensures precise control of the amount of energy deposited into the material. The unit is capable of producing beams with energies in the range of 20-250 KeV. TENCOR LSS-20SLAT is equipped with a highly sensitive monitor that detects the implantation of the charge carriers. This helps to ensure accurate and precise doping control. The machine can detect 65 different gasses including hydrogen, oxygen, nitrogen, and other rare elements. LSS-20SLAT also features an advanced low-pressure plasma source to improve the ion beam uniformity and accuracy. The tool is highly flexible and can be configured to meet specific requirements. It can be used for both single-wafer and batch-mode implantation. THERMA-WAVE LSS-20SLAT has achieved wide acceptance in the semiconductor industry as the most user-friendly, accurate, and reliable ion implanter available. It has proven itself in high-volume production, as well as in R&D applications. The asset has earned an enviable reputation for reliability, accuracy, flexibility, and performance. In conclusion, KLA / TENCOR / THERMA-WAVE LSS-20SLAT is an advanced ion implanter and monitor model that offers high accuracy and reliability for both research and production-level operations. The equipment's flexible configuration and cutting-edge technology make it an excellent choice for semiconductor application.
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