Used KLA / TENCOR / THERMA-WAVE ThermaProbe 420 #293619012 for sale

KLA / TENCOR / THERMA-WAVE ThermaProbe 420 is a state-of-the-art ion implanter and monitor designed to promote and control extremely precise implantation of ions in a semiconductor wafer. KLA ThermaProbe 420 features a broad range of ion energy ranges, from 50 eV to 450 keV and with a wide programmed current range to ensure optimal control over the implanting and monitor process. Its high performance and precision enable the implantation of a variety of materials into a range of materials, from silicon and silicon dioxide to polysilicon and compound semiconductor materials. The integrated beam monitoring system is capable of very fast, real-time shaping of the ion beams which allows for better control of the depth of implantation and provides an incredibly high precision for accuracy and repeatability. TENCOR THERMA-PROBE 420 also features a wide implant-to-implant dose variance range, providing maximum control over the implant dose on an individual basis. Its ultra-sensitive ion beam detectors detect even the smallest changes in the ion beam and alert the user to any discrepancies. The user can also adjust the beam position and beam shape to ensure a uniform implantation across all substrates. Additionally, its advanced data acquisition, analysis and reporting capabilities allow users to have all the information they need to track the progress of their implantation processes. TENCOR ThermaProbe 420 is also equipped with a large variety of beam sources with varying parameters such as harmonic frequencies and electrostatic energies, as well as an array of diagnostics and data acquisition instruments. This provides users with the flexibility to control the level of implanting and monitor the progress of their implantation processes. It also offers a wide variety of capabilities for adjusting beam parameters in order to achieve optimal precision and accuracy for both shallow and deep implants. In summary, THERMA-WAVE ThermaProbe 420 is a powerful, high-precision ion implanter and monitor that provides a high level of flexibility and accuracy for every implantation process. Its advanced data acquisition, analysis and reporting tools, integrated beam monitoring system, as well as its wide variety of beam sources and diagnostic instruments, make it the perfect choice for any high-precision implantation project.