Used KLA / TENCOR / THERMA-WAVE ThermaProbe 420 #9315382 for sale

KLA / TENCOR / THERMA-WAVE ThermaProbe 420
ID: 9315382
Vintage: 1993
Ion implanter Open handler, 8" 1993 vintage.
KLA / TENCOR / THERMA-WAVE ThermaProbe 420 is an advanced, versatile ion implanter and monitor engineered to provide clean, accurate processing of semiconductor material. The device is designed to meet the needs of high-precision applications such as chip manufacturing, as well as more demanding applications like MEMS and nanotechnology fabrication. This multi-functional machine is capable of implanting ions into pre-defined areas of semiconductor substrates, as well as accurately monitoring the process. At the heart of KLA ThermaProbe 420 lies a high-quality ion source that produces singly charged ions with high spatial accuracy and uniform dose rate. The ion source consists of a port, which can be configured to produce either positive or negative ions. The ions are generated through a combination of electrical, chemical, and thermal processes, ensuring clean, uniform implantation. The device is further enhanced with advanced software and hardware. With built-in diagnostics and monitoring capabilities, it is able to precisely control the dose and enrichment of ions in order to achieve the desired properties in the substrate. It also includes an emission spectrum analysis system, which records and displays the various elements present in the substrate, enabling engineers to adjust parameters for better control. TENCOR THERMA-PROBE 420 is highly flexible, providing programmable source parameters such as energy range, pulse length and frequency, current density, etch conditions, beam width and intensity, and more. This allows the user to precisely tailor the implanting process to produce the desired properties within the substrate, or to simulate a particular process. The device also features a mass filter, which enables the adjustment of ion energies, separating ions of different masses within the implant beam. This separation makes it possible to control the thickness and uniformity of the implanted layer, as well as refine the ion dose rate for precise outcomes. THERMA-PROBE 420 allows for simple and accurate use without sacrificing precision. It is an exceptional tool for any semiconductor application, as well as more specialized niche applications. With high accuracy, detailed process control, and safety mechanisms, it is a dependable platform for a wide range of applications.
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