Used KLA / TENCOR / THERMA-WAVE TP 420 #293636349 for sale

KLA / TENCOR / THERMA-WAVE TP 420 Ion Implanter & Monitor is an advanced semiconductor processing equipment that utilizes ion implanter technology to control dopant levels in the production of electronic components. KLA TP 420 features a robust design developed around a compact, low-cost platform and is ideal for applications requiring precision dopant control in the production of discrete devices, memory chips, and integrated circuits. The system is equipped with a number of advanced components, including a high-voltage power supply, a beam deflector, and an ion source. The high-voltage power supply supplies power to the ion source to generate the ion beam. The beam deflector uses magnetic fields to control the ion beam's path, allowing for accurate and repeatable delivery of ions to the target. The ion source is capable of producing a wide range of different dopant species, providing the unit with the flexibility needed to meet a wide range of production demands. The machine features a highly accurate and repeatable beam positioning tool, allowing for the delivery of repeatable ion implantation doses precisely where they are required. It is also equipped with an automated wafer handling asset, allowing for continued, uninterrupted operation without manual intervention. A built-in wafer collector prevents ions from escaping the model, ensuring that only the required amounts are implanted. The equipment is capable of operating in a wide range of temperature levels, from -4° to 75°C, and can be easily adjusted for optimal performance. TENCOR TP 420 is also equipped with a fully automated monitoring system, allowing it to continuously check the entire unit for performance and output, further increasing its reliability. The machine also features a control interface, allowing the end user to quickly make adjustments to the tool settings and parameters as needed. In summary, THERMA-WAVE TP 420 Ion Implanter & Monitor is an advanced ion implanter & monitor ideal for semiconductor production. It features a robust design, advanced components, and a host of features that provide the accuracy and reliability necessary for the production of electronic components. Its advanced monitoring asset, automated wafer handling, and adjustable temperature levels make it the ideal model for applications requiring precision dopant control.