Used LINTOTT Series III #9223576 for sale

ID: 9223576
Ion implanter Includes spare parts and electronics.
LINTOTT Series III is a highly advanced ion implanter and monitor with multiple capabilities allowing it to efficiently monitor each implant from start to finish. This equipment is capable of producing very tight beam spreads allowing operators to reliably boost implant energies with fine granular control. Series III also has the capability of utilizing up to 20 beam channels to maximize efficiency and ensure a well-defined implant profile. The system utilises a triple source configuration for optimum performance. The primary ion source is a high-energy argon ion implanter with an adjustable beam tune and an adjustable ion-optic design. A secondary ion source is also available for applications that require low-energy, high-dose implants. Finally, the unit includes a tertiary monochromatic deuteron source for better implant uniformity and battery-life extension. For maximum control and accuracy, LINTOTT Series III also comes equipped with a built-in ion implanter controller and integrated beam current monitor. The controller provides users with adjustable dose rates, enables precise alignment of implants, and provides active monitoring to ensure implants stay within process specifications. The onboard beam current monitor allows for real-time monitoring of implant current levels throughout the entire implantation process. In addition to the basic configuration, Series III machine can also be equipped with an optional High-Throughput In-Field Monitor, an advanced optical scanning tool that monitors the implant profile in real-time during the implant process, providing detailed 3D mapping of the beam. The integrated monitoring asset can be configured to provide additional parametric information such as beam spread, pitch value, range, and population size. Finally, LINTOTT Series III comes with a 10-year warranty that covers all essential components and parts. This model is highly reliable and designed to provide years of uninterrupted and powerful performance. The robust platform and user-friendly design make it ideal for production environments and processes requiring precision implantation and monitoring.
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