Used LOGITECH LC-9AS51KL07HJE #293671666 for sale

LOGITECH LC-9AS51KL07HJE is an advanced ion implanter & monitor for semiconductor production. Its features make it ideal for applications ranging from small prototypes to high-mix production. LC-9AS51KL07HJE can be equipped with a wide variety of ion sources including a direct current plasma source, an inductively coupled source, and a hybrid indium-film source. With this wide range of source choices, LOGITECH LC-9AS51KL07HJE can be tailored to meet the specific needs of any production environment. LC-9AS51KL07HJE also offers advanced scanning algorithms that allow for precise beam manipulation. This feature is especially useful during the implantation process when controlling the placement of ions is critical. The computer-controlled scanner head is able to adjust the beam according to the instructions programmed into its memory. LOGITECH LC-9AS51KL07HJE is also equipped with an integrated display that allows for easy monitoring of important parameters. The display can show dose and energy values as well as the current status of the ion implantation process. Additionally, the user interface is intuitive, allowing for quick setting of all necessary parameters. The advanced control capabilities of LC-9AS51KL07HJE make it an ideal choice for manufacturers who require tight control and precise results. The beam scans are extremely efficient, allowing for lower production costs and better yields. The system is also highly energy efficient, helping to keep production costs low and operating temperature low, both of which are important for reliability and longevity. LOGITECH LC-9AS51KL07HJE is also extremely safe to use. It is designed with several safety measures, including locking doors, emergency power shutdowns, and anti-collision sensors. Additionally, the system is connected to a network of sensors that monitor for any unusual events, errors, or malfunctions, and it is capable of providing real-time feedback to the operator. Ultimately, LC-9AS51KL07HJE is an all-in-one ion implanter and monitor. Its design makes it a reliable choice for production environments that demand performance and efficiency. Its advanced scanning algorithms, intuitive user interfaces, and safety features make it an attractive choice for semiconductor manufacturers.