Used NISSIN Exceed 2000 AH #293647879 for sale

NISSIN Exceed 2000 AH is an ion implanter and monitor that provides superior control of dopant diffusion and accuracy of semiconductor fabrication. It is designed to ensure superior doping accuracy and process performance, while helping to reduce costs. NISSIN EXCEED 2000AH brings together advanced ion-implantation technology and NISSIN Process Monitor integration to provide the highest levels of ion implantation accuracy and dependability available. Exceed 2000 AH features a high-voltage, single-source ion implanter and a comprehensive monitor package for extensive process control. It boasts an improved shutter design that allows for easy implanting and end-point detection accuracy. An integrated ion source enables accurate implanting of ions with abundant ion beam fluence, uniform vertical profiles, and extremely low contaminants. EXCEED 2000AH also includes an improved beam-monitoring equipment, which enables superior process control and prevention of ion beam misdirection. NISSIN Exceed 2000 AH features an improved beam-focusing system and an ultra-wide frequency range to provide enhanced process control. NISSIN EXCEED 2000AH also offers enhanced control and monitoring of all major parameters of the implanting cycle, with the ability to define implant points, monitor concentrations, and detect end-points quickly. In addition, Exceed 2000 AH uses multiple detectors, including thermocouple and synchrotron detectors, to achieve maximum accuracies in doping control. EXCEED 2000AH includes NISSIN FPM (Fourier Processor Monitor), which ensures accurate implantation of dopants into semiconductor substrates. The FPM also features a wide range of process functions, allowing for reliable and repeatable implant characteristics to be obtained with minimal effort, such as uniform vertical profiles, ion beam fluences, and synthesis of accurate dose profiles. NISSIN Exceed 2000 AH provides a variety of capabilities to help ensure optimal process control, improve unit performance, and reduce costs. These include improved surface coverage, improved Monitoring and Control (M&C), advanced analysis capabilities, remote diagnostics and auditing, and improved machine control, as well as fully automated control of wafer substrate temperature and ion beam current. In addition, NISSIN EXCEED 2000AH is designed to be easily integrated with existing process control systems to provide improved process performance. Overall, Exceed 2000 AH offers an extensive range of advanced features to ensure superior ion implantation accuracy and reliability. It provides an effective, cost-effective solution for tight process control, leading to improved yields and reduced semiconductor defects. With its automated control, improved accuracy, and improved monitoring, EXCEED 2000AH is an ideal solution for semiconductor fabrication.