Used NISSIN Exceed 2000 #293748708 for sale

NISSIN Exceed 2000 is an advanced ion implantation and monitoring equipment that is widely used in the semiconductor industry. It is suitable for a wide range of ion beam parameters and applications, providing accurate, reliable and repeatable performance. Exceed 2000 is a high-power pulsed ion implanter, capable of delivering up to 20kV of implant energy with beam currents up to 500mA. It has a compact footprint with a variable output window, which allows for flexible technical implementation and enhanced process control. The system includes a variable beam angle, adjustable scan angle and variable energy spread. The chamber is equipped with a variable energy scan to precisely control the energy spread and a variable pulse gap to optimize implant conditions. NISSIN Exceed 2000 has integrated vacuum and coolant systems for efficient operation and protection of sensitive components. It also comes with an advanced control unit that provides high levels of accuracy and repeatability. The machine is designed to perform at peak efficiency and reliability through optimization of the dose rate, pressure, and chamber operation. A high speed vision tool is integrated into the asset to provide precise imaging and active analysis of inputs and outputs. Exceed 2000 benefits from a comprehensive set of diagnostic tools that allow for easy and efficient diagnostic operations. The software package includes a comprehensive set of process monitoring tools that can be configured to provide users with process characterization and debugging. Several advanced features such as the "Data Pre-Conditioner" tool provide even further insight into the performance process. NISSIN Exceed 2000 is an advanced ion implantation and monitoring model that provides reliable, repeatable results with a high level of accuracy and control. It is an ideal choice for semiconductor applications and processes.