Used NISSIN Exceed 2000 #9134046 for sale

NISSIN Exceed 2000 is an innovative ion implanter and monitor specifically designed for production needs and research applications. This unique equipment provides superior beam transport, uniformity, and control over dose accuracy. The system integrates a 2 axis scan, and its proprietary '3D Cell' nozzle enables slicing and dicing of wafers, which reduces particle debris and cross-contamination. Exceed 2000 is a commonly used fabrication equipment used for many different applications, ranging from general engineering to microelectronics and nanotechnology. NISSIN Exceed 2000's single object beam unit provides exceptional accuracy for both small and large area ion implantations. The single source beam optimize accumulated error and alignment to keep particle contamination on the wafer's surface to an absolute minimum. The machine offers an array of adjustable beam scans, which allows for different shaped implants and even implantation of trapezoidal and circular shapes. Exceed 2000 allows tight control of ion beam parameters for better results. For instance, the shape and dose uniformity of the implants can be fine-tuned by the use of the tool's separate pre- and post-accelerating stages. The asset also offers a wide range of advanced features, such as the fast auto-tuning facility, programmable bevels, and automated loading arms. This ensures optimal beam characteristics for challenging process recipes. NISSIN Exceed 2000 is designed with a robust motion control model and a real-time monitoring suite for implantation performance. Its patented high-sensitivity particle sensor ensures quick detection of contaminations and abnormal doses. Furthermore, its integrated error detection scheme automatically rejects and suspends implanted wafers from further implantation, which ensures consistently high quality results. Exceed 2000 can also be integrated with advanced computer accessories for additional monitoring. Its advanced PC control interface allows operators to easily and quickly take corrective actions. The equipment also offers an array of reporting and diagnostics tools, which are essential for research and development purposes. Additionally, NISSIN Exceed 2000 allows operators to adjust different parameters to maximize implantation efficiency for each application. Overall, Exceed 2000 is the ideal system for precise, efficient, and high-quality ion implantation and monitoring. Its unique features simplify projects, maximize yield, and reduce risks for manufactured parts and devices.