Used NISSIN Exceed 2000 #9178081 for sale

ID: 9178081
Wafer Size: 8"
Medium current ion implanter, 8".
NISSIN Exceed 2000 is a high-performance, automated ion implanter and monitor for high precision ion implantation. It offers outstanding performance in terms of productivity and accuracy, making it an ideal choice for semiconductor device fabrication and research. Exceed 2000 is a multi-axis, multi-source implanter that uses a variety of ions, including Gallium, Fluorine, Arsenic, Phosphorus, and Boron. The system has a large 500mm x 250mm target chamber, making it suitable for large-scale ion implanting. The power supplies are all independently regulated, allowing for precise control of the ion dosage. The beam optics and angular alignment can be set up for high resolution implantation, which allows for highly precise control of the ion energy, diameter, and angle. NISSIN Exceed 2000 has an integrated monitoring system that can be used for constant monitoring of the implantation process. It has a choice of optical alignment and electronic monitoring systems, which can detect any changes in the dose integrity during implanting. This helps to ensure that the ion dose remains consistent throughout the process. Exceed 2000 comes equipped with a wide range of software and automation features, allowing users to easily control and manage the implantation process. The intuitive user interface allows for easy navigation and control of the system. It also features predefined implantation recipes and the option to create custom recipes for specific tasks. The software also has visualization and reporting modules so users can quickly view and analyze implanting results. NISSIN Exceed 2000 is a reliable, user-friendly ion implanter and monitor, suitable for a variety of applications. With its high accuracy, precision, and automation, Exceed 2000 provides an efficient and effective solution for high-quality ion implantation.
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