Used NISSIN Exceed 2000 #9210341 for sale

NISSIN Exceed 2000 is a state-of-the-art ion implanter and monitor that combines precision and accuracy in order to deliver superior results. Exceed 2000 utilizes a linear accelerator with a frequency pre-selection equipment and multiple segments to allow for complete control over dose and energy parameters. This, in combination with its high speed digital beam position control system, helps to ensure the highest level of accuracy, enabling users to get the exact result they are looking for. Additionally, NISSIN Exceed 2000 includes a high-sensitivity in-situ monitor for realtime monitoring of implanted dose and beam uniformity, ensuring accurate plasma doping and wafer-tilt compensation. The monitor also measures beam contamination and damage levels that can occur in advanced ion implantation. This helps to eliminate damage and contamination, as well as improve wafer characteristics. Exceed 2000 also includes an intuitive graphical user interface (GUI) to allow users to easily control the unit and monitor parameters. This interface includes easy to comprehend graphics, which allows for simple operation, reducing the setup and learning time for users. It also enables users to quickly change implant conditions and parameter settings, improving process flexibility and efficiencies. NISSIN Exceed 2000 also includes many other features that set it apart from other ion implanters on the market. These features include support for a wide range of implant materials, a variety of dose setting options, and an easy to use remote interface. Furthermore, Exceed 2000 is designed with an incorporated automated cleaning machine that can help reduce downtime and improve yields. In conclusion, NISSIN Exceed 2000 is a high-quality, precision ion implanter equipped with powerful features that give users the ultimate level of control and accuracy. From its linear accelerator and high-sensitivity in-situ monitor to its intuitive graphical user interface and automated cleaning tool, Exceed 2000 provides users with the necessary tools to achieve the best results for their ion implantations.