Used NISSIN Exceed 2000 #9221084 for sale

NISSIN Exceed 2000 is an ion implanter and monitor used to provide a reliable and versatile ion implantation solution for semiconductor device fabrication. Specifically, ions are accelerated and implanted onto a material such as silicon to modify its electrical characteristics. Exceed 2000 consists of four main components: the ion source, the beam line, the end station, and the monitor. The ion source consists of two separate chambers, a metallic ion source and a gas ion source. The ion source is connected to the beam line, which consists of a set of magnets for bending and focusing the beam. The end station is used to deliver the ions to a substrate surface. The monitor is used to monitor and control the beam during operation. NISSIN Exceed 2000 can be programmed to perform a wide range of implantation processes, from single-level implants to high-current mixed-level implants. It has a high degree of beam control and can operate with a beam energy ranging from 1 keV to 25 keV and a beam current ranging from 1 mA to 120 mA. Furthermore, Exceed 2000 features a number of safety and security features, such as the ability to detect beam breaks and auto-shutdown. NISSIN Exceed 2000 is a powerful and reliable tool for ion implantation, and it has been extensively used in various applications, such as semiconductor device fabrication and medical isotope production. Its features make it an excellent choice for those requiring an advanced and reliable technology.