Used NISSIN Exceed 2300AH #293595915 for sale

NISSIN Exceed 2300AH is a sophisticated and reliable ion implanter and monitor developed by NISSIN Corporation. It is used to precisely implant ions in semiconductors, compound materials, and other engineering processes. Specifically, it is applicable to a wide range of high-precision processes such as shallow-implantation, deep-implantation, total dose and local dose implants, small-angle ion beam sputter processing, and in-situ ionization. Exceed 2300AH is designed for a maximum total beam circulating current of up to 2300 amperes, a beam current range from 0.1 to 2000 μA, and a beam energy range from a few hundred eV to 2000 keV. It features fast response time, a wide range of operating pressures and temperatures, and high sensitivity to sample changes. The equipment is also equipped with a high-gradient electrostatic optical alignment system for highly efficient and accurate operation. In addition, NISSIN Exceed 2300AH utilizes a comprehensive monitoring system to ensure maximum accuracy and repeatability of the monitored parameters during the implant procedure. The system includes an advanced beam current detector that enables accurate beam current measurement over a wide range, a beam profile monitor to ensure homogeneity of the implanted area, a particle detector to monitor particle contamination, and a range of ion optical elements that enhance the ability to control beam divergences, angles, and mass selections. This device is well-suited for use in materials that require highly precise and accurate implantation, such as semiconductor wafers, materials for MEMS or bio-applications, as well as for materials for medical devices. Exceed 2300AH is highly reliable, and NISSIN Corp. provides excellent customer service and technical support. Its features, functions, and user-friendly interface make it the equipment of choice for reliable and precise ion implantation.