Used NISSIN Exceed 2300AV #198070 for sale

NISSIN Exceed 2300AV is an ion implanter and monitor that provides superior performance and versatility. The machine can implant various ions such as boron, phosphorus, or oxygen into a variety of semiconductor materials. It is capable of implanting ions up to a maximum energy of 8MeV with an accuracy of ± 5V and has a duty cycle of 1.1% per hour. This allows for precise and repeatable thermal diffusion of ions into the substrates, which helps reduce device variability and enables complex transistor designs. Exceed 2300AV also features a Multi-Grid Monitor that provides real-time information about the implanted ions, allowing for efficient and accurate control of the beam current. The patented SCALON Focus system provides excellent irradiation precision with linewidths up to 0.27µm and total ion beam current accuracy of ±1%, ensuring that each device contains the correct level of ions. In addition, the VIBEJET ion beam enables uniform implantation of ions with a uniform energy spread of 1%. NISSIN Exceed 2300AV also features superior non-uniformity compensation technology. This includes a uniformity correction algorithm that minimizes the non-uniformities in the implant profile by adjusting the beam current, implant angle, and dose of the beam over the wafer during implantation. This provides improved yield and uniform performance for all devices on a single wafer. Overall, Exceed 2300AV is a versatile and reliable ion implanter and monitor which provides excellent performance with features such as its Multi-Grid Monitor, SCALON Focus system, and VIBEJET ion beam. Its non-uniformity compensation technology ensures uniform device performance, helping to ensure cost-efficient production and reduced time to market.