Used NISSIN Exceed 3000 #9393124 for sale

NISSIN Exceed 3000 is a high-performance ion implanter and monitor developed by NISSIN Corporation, renowned producers of semiconductor manufacturing machinery and equipment. It offers ultra-precise ion implantation of substrates for a wide range of semiconductor applications, with advanced features that enable in-depth substrate analysis and monitoring of the implantation process. The machine's advanced tools provide the user with the ability to accurately and reliably control the configuration parameters (including implantation current, dwelling time, depth, and fluence) of the implanting ions, allowing for the most precise and efficient implantation and the highest-quality results. At the heart of Exceed 3000 is its modular and adaptable design. It utilizes a multi-chamber system that can accommodate up to four ion sources, each with different properties, allowing the user to customize implantation operations and maximize throughput and productivity. The cell further offers several innovations that contribute to its high-powered performance, such as a powerful multi-axis motion controller for fast and precise concentric rotation, a high-voltage and high-flux beam focusing system for optimal ion beam scanning, and a high-energy pneumatic delay line for optimized energy distribution. NISSIN Exceed 3000 also features several advanced monitoring and analysis components for meticulous measurement and analysis of the ion implanting process. It can detect and monitor ion backscatter emitted from the substrate during implantation, and a range of secondary-ion mass spectrometry (SIMS) measurements can be taken from the substrate surface before and after implantation. These detailed analyses provide users with critical feedback on the implantation process, allowing them to adjust their implantation settings accordingly. Furthermore, the machine can measure the depth profile of the substrate with great precision, providing an accurate record of the implantation process. In conclusion, Exceed 3000 is a state-of-the-art ion implanter and monitor that offers unparalleled performance, precision, and control. Through its advanced modular and adaptable design, advanced beam focusing system, and comprehensive monitoring and analysis tools, the machine provides a comprehensive solution and an unbeatable platform for the most exacting ion implantation tasks.