Used NISSIN Exceed 300AH #9103092 for sale

NISSIN Exceed 300AH is a highly versatile and reliable ion implanter and monitor designed to fabricate highly precise semiconductor devices. It is an ideal choice for sophisticated semiconductor device manufacturers as it can perform high-precision implantation of light ions, such as boron, phosphorus, and arsenic, as well as heavier metal ions, such as copper, gold, and silver. Exceed 300AH has Dual Mode Process Control Technology that monitors and controls the ion implantation operation to ensure the delivered energy and dose are kept within pre-determined limits. This dual mode process control technology also has the ability to alter the implantation parameters to adjust the dose uniformly in real-time, ensuring high accuracy and precision of the implantation operation. Additionally, with its built-in scan detector system, it is able to automatically detect and adjust the parameters for optimal implantation. NISSIN Exceed 300AH has a modular design that offers users the flexibility to extend their ion implantation installation, along with a number of peripheral components. These components include a target reflector, a scan controller, an ion source power supply, a detector table, and a low-voltage connector. Exceed 300AH also has a fully integrated power supply system that ensures a stable and reliable energy throughout the entire implantation cycle, thereby extending the life of the components. Moreover, it integrates a low-voltage detector that enables the user to monitor the implantation process during implantation operations. This ensures that all deposited ions are implanted at the same depth, resulting in tighter implantation control. Furthermore, NISSIN Exceed 300AH includes sophisticated diagnostics to optimize substrate temperature and particle uniformity. It offers automatic nozzle-positioners, which facilitate accurate ion implantation as well as increased throughput of ions by ensuring a uniform dose. The machine also has a number of safety features, such as exclusion zones, to prevent accidental damage to critical components due to over-dosing, or other high energy particles entering sensitive areas. Exceed 300AH is designed to offer excellent control over precise ion implantation operations for a variety of applications, including implantation of semiconductor devices. It's a reliable and advanced device that offers an exceptional level of process control and accuracy for ion implantation operations.