Used NISSIN IHC 3000 #9103089 for sale

NISSIN IHC 3000 ion implanter and monitor is a sophisticated piece of equipment used for implanting ions into substrates. It is capable of implanting ions into a variety of substrates including crystalline and amorphous materials, metals, semiconductors, and polymers. IHC 3000 is built with an ion source, acceleration chamber, beam line, sample area, and digital monitor. The ion source is responsible for supplying positively charged ions to be implanted. The acceleration chamber is responsible for creating the desired energy level for the ions. The beam line then determines the implantation angle, and the sample area allows for targeted implantation into the desired substrate. The digital monitor is responsible for monitoring the process and helping the user to adjust parameters as desired. NISSIN IHC 3000 is designed with a host of features to maximize accuracy, safety, and economy. To ensure accurate implantation of desired ions, it is capable of controlling energy, intensity, beam current, and dwell time for each implantation step. Additionally, it features a low vacuum equipment to reduce potential damage to the substrate caused by the vacuum created by the implantation process. In order to increase safety and provide a greater peace of mind, IHC 3000 is equipped with an over-current monitor and circuit protection to protect against any potential excess current or voltage. Furthermore, a grounding system is included to ensure that the equipment remains as safe as possible to operate. Finally, NISSIN IHC 3000 is designed to increase economy and extend the lifetime of the implantation equipment. It features a vacuum chamber designed to reduce or prevent contamination that would otherwise require costly cleaning, a self-calibrating internal current monitoring unit for greater consistency and accuracy, and a semiconductor recycling machine to conserve material while maintaining desired charge levels. IHC 3000 is a highly advanced ion implanter and monitor, built with a set of features designed to maximize accuracy, safety, and economy. Its simple operation and reliable performance make it an ideal choice for implanting ions into a variety of substrates.