Used NISSIN NH 20SP EX #293603084 for sale
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ID: 293603084
Wafer Size: 8"
Vintage: 1996
Medium current implanter, 8"
(4) Carrier cassettes
(2) Electrostatic electrocodes
Swing-arm scan mechanism
Parallel beam implantation
Dose uniformity control
In-situ parallelism and uniformity monitor
Large-tilt-angle implantation
Implantation modes: Step rotation / Angle step
1996 vintage.
NISSIN NH 20SP EX is a state-of-the-art ion implanter and monitor designed and manufactured by NISSIN Electric Co. Ltd. It is built to offer reliable, precise, and efficient beam coverage of substrates of various materials. NH 20SP EX uses a high-power electron gun (HPG) to generate ions which are then accelerated onto substrates for implantation. This ion implanter is equipped with a high-precision, illuminated reticle and motorized stage for precise alignment, highly efficient two-dimensional scanning, and uniform beam coverage. It can deliver an acceptably wide range of beam currents and energies, making it suitable for multiple implantation applications. NISSIN NH 20SP EX utilizes a multichannel implanter monitor, comprising three Lambda diodes for continuous measurement of implant parameters. This monitor can easily detect minor variations in the operating parameters, quickly compensating for any imperfections to maintain the desired implantation process. NH 20SP EX also features a Y beam-shaping system which prevents generation of any secondary ions. This further facilitates uniform beam coverage to substrates of any size. Additionally, an integrated precision positioning system allows highly accurate beam centering of substrate surfaces. To ensure safety and operational efficiency, NISSIN NH 20SP EX is provided with enclosed, interlocked doors. These doors are both an safety device as well as a means of providing non-stop service in order to maximize productivity. Overall, NH 20SP EX is a versatile, precise, and highly reliable ion implanter and monitor. It is equipped with a wide range of advanced features and is the ideal choice for reliable, precise and high-speed implantation of substrates of any material.
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