Used NISSIN NH-20SR #293776330 for sale

NISSIN NH-20SR is a high performance ion implanter and monitor designed for semiconductor device fabrication. It is capable of implanting dopants such as boron, phosphorus, and arsenic as well as other materials into a silicon wafer with a high sample rate and excellent precision. NISSIN NH 20SR utilizes ion beam bombardment to drive doping ions into the lattice structure of the target material, allowing for precise control over the amount and distribution of doping elements in the material. NH-20SR offers a wide range of implantations with an implantation energy range of 1 keV to 250 keV. This allows for flexibility in doping layers from low-temperature to ultra-shallow junction processes. It also provides very high precision implantations with an accuracy of ±1 % in ion count interpolation and ±3 % in ion energy distribution. This allows for precision invasions even into very tight geometries. NH 20SR comes with a comprehensive monitoring system that includes a high speed closed loop scan controller, which records current position, rate of scan and total scan area for the maximum duration of each implantation cycle. This makes it easier to detect errors and correct them in time. In addition, the system offers optional co-extraction and beam-dumping functions to provide smoother and uniform implanting process. NISSIN NH-20SR also features integrated pre-acceleration, putting the ions in the desired energy range before they enter the target material. This ensures accuracy and repeatability of doping into precise layers. NISSIN NH 20SR is one of the most efficient and reliable ion implanters and monitors in the market. It is easy to use and maintain and comes with a two-year warranty against defects in materials and workmanship. For these reasons, it is a great option for semiconductor device fabrication.